发明授权
- 专利标题： Optical element deformation system
- 专利标题（中）： 光学元件变形系统
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申请号： US09956715申请日： 2001-09-19
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公开(公告)号： US06844994B2公开(公告)日： 2005-01-18
- 发明人: Frank Melzer , Michael Mühlbeyer , Bernhard Gellrich , Franz Sorg , Stefan Xalter , Thomas Ittner
- 申请人： Frank Melzer , Michael Mühlbeyer , Bernhard Gellrich , Franz Sorg , Stefan Xalter , Thomas Ittner
- 申请人地址： DE
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE
- 代理机构： Wells St. John P.S.
- 优先权： DE10046379 20000920
- 主分类号： G02B26/00
- IPC分类号： G02B26/00 ; G02B5/10 ; G02B13/24 ; G02B26/06 ; G02B26/08 ; G02B27/00 ; G02B27/18 ; G03F7/20 ; H01L21/027 ; G02B7/02
摘要：
In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.
公开/授权文献
- US20020048096A1 Optical element deformation system 公开/授权日：2002-04-25
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