利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

70 条记录 (耗时 0.028 秒)

    Oscillation damping system
    2.
    发明授权
    Oscillation damping system 失效
    振荡阻尼系统

    公开(公告)号：US06700715B2

    公开(公告)日：2004-03-02

    申请号：US10016704

    申请日：2001-12-11

    申请人： Franz Sorg ,  Stefan Xalter ,  Michael Muehlbeyer ,  Bernhard Gellrich ,  Frank Melzer ,  Thomas Ittner

    发明人： Franz Sorg ,  Stefan Xalter ,  Michael Muehlbeyer ,  Bernhard Gellrich ,  Frank Melzer ,  Thomas Ittner

    IPC分类号： G02B702

    CPC分类号： G03F7/709 ,  F16F15/005 ,  F16F15/02 ,  G02B27/646

    摘要： In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.

    摘要翻译： 在振荡阻尼系统中，作用在成像装置中的光学元件，特别是在投影照明装置中的变形解耦安装件和操纵器上的振荡，特别是用于微光刻投影曝光物镜光刻的投影物镜中的振荡被检测 通过致动器产生具有与干扰振荡相同或至少相似的频率和反相振幅的致动器传感器，并将其引入到所述安装件中。

    System for damping oscillations
    3.
    发明授权
    System for damping oscillations 失效
    阻尼振荡系统

    公开(公告)号：US06897599B2

    公开(公告)日：2005-05-24

    申请号：US10075797

    申请日：2002-02-12

    申请人： Franz Sorg ,  Stefan Xalter ,  Frank Melzer ,  Bernhard Gellrich ,  Michael Muehlbeyer

    发明人： Franz Sorg ,  Stefan Xalter ,  Frank Melzer ,  Bernhard Gellrich ,  Michael Muehlbeyer

    IPC分类号： F16F15/00 ,  F16F15/02 ,  F16L55/04 ,  G03F7/20 ,  H01L21/027 ,  H01L41/09 ,  H01L41/08

    CPC分类号： G03F7/70991 ,  F16F15/005 ,  F16F15/02 ,  G03F7/709

    摘要： In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (5), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (9), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.

    摘要翻译： 在用于克服或至少阻挡在通道（9）中或至少阻尼振荡的系统中，所述通道（9）承载组件中的流体，特别是光学元件（1）中的冷却通道中的冷却剂，特别是用于半导体的投影物镜（1a） 光刻，发生的振荡由传感器（5）检测和评估，之后结果通过自适应控制环路形式的压电元件（9）的形式，压电元件（9）集成在光学元件中，呈现形式 薄板，薄膜或层，当被激活时，产生抵消由湍流产生的振荡和固有频率的振荡或频率。

    Optical arrangement in a projection exposure apparatus for EUV lithography
    8.
    发明授权
    Optical arrangement in a projection exposure apparatus for EUV lithography 有权
    用于EUV光刻的投影曝光装置中的光学布置

    公开(公告)号：US09298111B2

    公开(公告)日：2016-03-29

    申请号：US13405882

    申请日：2012-02-27

    申请人： Viktor Kulitzki ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

    发明人： Viktor Kulitzki ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

    IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/32 ,  G03F7/20 ,  G02B7/00

    CPC分类号： G03F7/70916 ,  G02B7/00 ,  G03F7/70233 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70891

    摘要： An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

    摘要翻译： 光学装置包括多个光学元件和承载光学元件的载体结构。 载体结构由至少两个可释放地互连的模块组成。 每个模块由至少一个载体结构子元件组成。 子载体由多个载体结构子元件和/或模块产生。 子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状，可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络 到投影曝光装置的像平面。 用于EUV光刻的投影曝光装置包括这种光学装置。

    OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY
    9.
    发明申请
    OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY 有权
    投影曝光装置的光学布置

    公开(公告)号：US20120188523A1

    公开(公告)日：2012-07-26

    申请号：US13405882

    申请日：2012-02-27

    申请人： Viktor Kulitsky ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

    发明人： Viktor Kulitsky ,  Bernhard Gellrich ,  Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Peter Deufel ,  Andreas Wurmbrand

    IPC分类号： G03B27/70 ,  G02B7/182

    CPC分类号： G03F7/70916 ,  G02B7/00 ,  G03F7/70233 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70891

    摘要： An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

    摘要翻译： 光学装置包括多个光学元件和承载光学元件的载体结构。 载体结构由至少两个可释放地互连的模块组成。 每个模块由至少一个载体结构子元件组成。 子载体由多个载体结构子元件和/或模块产生。 子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状，可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络 到投影曝光装置的像平面。 用于EUV光刻的投影曝光装置包括这种光学装置。

    Optical imaging device with thermal attenuation
    10.
    发明授权
    Optical imaging device with thermal attenuation 有权
    具有热衰减的光学成像装置

    公开(公告)号：US08363206B2

    公开(公告)日：2013-01-29

    申请号：US12267074

    申请日：2008-11-07

    申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70341 ,  G03F7/70891

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。