发明授权
- 专利标题： Positive resist composition
- 专利标题（中）： 正抗蚀剂组成
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申请号： US09961281申请日： 2001-09-25
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公开(公告)号： US06852467B2公开(公告)日： 2005-02-08
- 发明人: Toshiaki Aoai , Shoichiro Yasunami , Kazuyoshi Mizutani , Shinichi Kanna
- 申请人： Toshiaki Aoai , Shoichiro Yasunami , Kazuyoshi Mizutani , Shinichi Kanna
- 申请人地址： JP Kanagawa
- 专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人地址： JP Kanagawa
- 代理机构： Sughrue Mion, PLLC
- 优先权： JPP.2000-292537 20000926; JPP.2000-379284 20001213; JPP.2001-062158 20010306; JPP.2001-202298 20010703
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/039 ; H01L21/027
摘要：
A positive resist composition comprising: (A) a fluorine group-containing resin having: a structure wherein at least one of the main chain and the side chain of the polymer skeleton has at least one fluorine atom; and having a group capable of decomposing under the action of an acid to increase the solubility in an alkali developer; (B) a compound capable of generating an acid upon irradiation with one of actinic ray and radiation, and (C) a surfactant containing at least one of a silicon atom and a fluorine atom.
公开/授权文献
- US20020061464A1 Positive resist composition 公开/授权日：2002-05-23
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