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公开(公告)号：US06852467B2
公开(公告)日：2005-02-08
申请号：US09961281
申请日：2001-09-25
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/108
摘要： A positive resist composition comprising: (A) a fluorine group-containing resin having: a structure wherein at least one of the main chain and the side chain of the polymer skeleton has at least one fluorine atom; and having a group capable of decomposing under the action of an acid to increase the solubility in an alkali developer; (B) a compound capable of generating an acid upon irradiation with one of actinic ray and radiation, and (C) a surfactant containing at least one of a silicon atom and a fluorine atom.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）含氟基树脂，其具有以下结构：其中所述聚合物骨架的主链和侧链中的至少一个具有至少一个氟原子; 并且具有能够在酸的作用下能够分解以增加在碱性显影剂中的溶解度的基团;（B）在用光化学射线和辐射之一照射时能够产生酸的化合物，和（C）含有 硅原子和氟原子中的至少一个。
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公开(公告)号：US07138217B2
公开(公告)日：2006-11-21
申请号：US10099981
申请日：2002-03-19
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprises: (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, wherein the resin (A) contains a specified repeating unit.
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公开(公告)号：US06485883B2
公开(公告)日：2002-11-26
申请号：US09769375
申请日：2001-01-26
申请人： Kunihiko Kodama , Shinichi Kanna , Toshiaki Aoai
发明人： Kunihiko Kodama , Shinichi Kanna , Toshiaki Aoai
IPC分类号： G03F7039
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A positive photoresist composition which comprises (A) a resin having a group which decomposes by the action of an acid to increase solubility in an alkaline developing solution, and (B) a compound which generates an aliphatic or aromatic carboxylic acid substituted with at least one fluorine atom upon irradiation with an actinic ray or radiation. The positive photoresist composition of the present invention is improved in resolution and process allowance such as exposure margin and depth of focus in a lithographic technology using a light source having a short wavelength capable of conducting the ultra fine fabrication and a chemical amplification-type positive photoresist. Further, it exhibits the excellent performance when an electron beam is used as a light source for exposure.
摘要翻译： 一种正型光致抗蚀剂组合物，其包含（A）具有通过酸的作用分解以提高在碱性显影液中的溶解度的基团的树脂，和（B）产生被至少一个 通过光化射线或辐射照射，本发明的正性光致抗蚀剂组合物在使用具有短波长能够导电的光源的光刻技术中的分辨率和工艺容限（例如曝光余量和焦深）方面得到改善 超精细制造和化学放大型正性光致抗蚀剂。 此外，当使用电子束作为曝光用光源时，其表现出优异的性能。
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4.发明申请公开(公告)号：US20050048402A1
公开(公告)日：2005-03-03
申请号：US10929443
申请日：2004-08-31
IPC分类号： G03F7/039 , G03C1/76 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , Y10S430/114
摘要： A positive resist composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution and includes a specific repeating unit and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and a pattern formation method using the positive resist composition.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）通过酸的作用而分解以提高在碱性显影液中的溶解度的树脂的树脂，并且包括特定重复单元和（B）在光化射线照射时产生酸的化合物或 辐射和使用正性抗蚀剂组合物的图案形成方法。
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公开(公告)号：US06878502B2
公开(公告)日：2005-04-12
申请号：US10187291
申请日：2002-07-02
申请人： Kazuyoshi Mizutani , Shinichi Kanna
发明人： Kazuyoshi Mizutani , Shinichi Kanna
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/108 , Y10S430/115
摘要： A positive resist composition comprises (A) a resin which comprises a specified repeating units and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation.
摘要翻译： 正型抗蚀剂组合物包含（A）包含特定重复单元的树脂和（B）在用光化射线和辐射之一照射时能够产生酸的化合物。
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6.发明授权Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene 有权（双 - 三氟甲基）甲基取代苯乙烯的正性抗蚀剂组合物公开(公告)号：US06743565B2
公开(公告)日：2004-06-01
申请号：US10156227
申请日：2002-05-29
IPC分类号： G03F7039
CPC分类号： G03F7/0046 , G03F7/0392 , Y10S430/108 , Y10S430/115
摘要： A positive resist composition is disclosed, comprising (A) a resin containing at least one repeating unit represented by the following formula (I) and at least one repeating unit represented by formula (VII), which decomposes under the action of an acid to increase the solubility in an alkali developer, and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.
摘要翻译： 公开了一种正型抗蚀剂组合物，其包含（A）含有至少一个由下式（I）表示的重复单元的树脂和至少一种由式（VII）表示的重复单元，其在酸的作用下分解以增加 在碱性显影剂中的溶解度，和（B）在用光化射线或辐射照射时能够产生酸的化合物。
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公开(公告)号：US07198880B2
公开(公告)日：2007-04-03
申请号：US10422789
申请日：2003-04-25
IPC分类号： G03F7/004
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound which is capable of generating an acid by the action of actinic ray or radiation.
摘要翻译： 正性抗蚀剂组合物包含
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公开(公告)号：US06939662B2
公开(公告)日：2005-09-06
申请号：US10448041
申请日：2003-05-30
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/114
摘要： A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation.
摘要翻译： 一种正性抗蚀剂组合物，其包含：（A1）含有由所述特定式表示的重复单元的树脂，其通过酸的作用增加在碱性显影液中的溶解度，和（B）能够产生酸的化合物 用光化射线和辐射之一照射时。
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公开(公告)号：US07335454B2
公开(公告)日：2008-02-26
申请号：US10317110
申请日：2002-12-12
IPC分类号： G03C1/00
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/114 , Y10S430/115
摘要： A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubility in an alkali developer and (B) an acid generator capable of generating an acid upon irradiation of an actinic ray or radiation, and the acid generator of (B) is a compound selected from a sulfonium salt containing no aromatic ring and a compound having a phenacylsulfonium salt structure.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）在聚合物骨架的主链和/或侧链中具有被氟原子取代的结构的含氟基树脂和通过酸的作用而分解的基团以增加 在碱显影剂中的溶解度和（B）能够在光化射线或辐射照射时能产生酸的酸发生剂，（B）的酸产生剂是选自不含芳环的锍盐和具有 苯甲酰锍盐结构。
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公开(公告)号：US07214467B2
公开(公告)日：2007-05-08
申请号：US10455459
申请日：2003-06-06
IPC分类号： G03F7/00
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/114 , Y10S430/115
摘要： The photosensitive resin composition of the present invention is an excellent photosensitive resin composition: exhibiting significant transmissibility at the use of an exposure light source of 160 nm or less, more specifically F2 excimer laser light, where line edge roughness and development time dependence are small and a problem of footing formation is improved; and comprising a resin which decomposes by an action of acid to increase the solubility in alkali developer, in which the resin contains a specific repeat unit; a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, in which the compound includes at least two kinds of compounds selected from the group consisting of specific compounds (B1), (B2), (B3) and (B4).
摘要翻译： 本发明的感光性树脂组合物是优异的感光性树脂组合物，其在使用160nm以下的曝光光源，更具体地是2/2准分子激光的情况下显示显着的透射性，其中线边 粗糙度和开发时间依赖性小，基础形成问题得到改善; 并且包含通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂，其中树脂含有特定的重复单元; 其中化合物包括选自特定化合物（B1），（B2），（B3）和（B3）中的至少两种化合物， （B4）。
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