Invention Grant
- Patent Title: Methods and apparatus for generating high-density plasma
- Patent Title (中): 用于产生高密度等离子体的方法和装置
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Application No.: US10065629Application Date: 2002-11-04
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Publication No.: US06853142B2Publication Date: 2005-02-08
- Inventor: Roman Chistyakov
- Applicant: Roman Chistyakov
- Applicant Address: US MA Mansfield
- Assignee: Zond, Inc.
- Current Assignee: Zond, Inc.
- Current Assignee Address: US MA Mansfield
- Agency: Rauschenbach Patent Law Group, LLC
- Agent Kurt Rauschenbach
- Main IPC: B01J19/12
- IPC: B01J19/12 ; C23C14/34 ; C23C14/35 ; C23C16/452 ; C25B9/00 ; C25B13/00 ; H01J7/24 ; H01J37/32 ; H01J37/34

Abstract:
Methods and apparatus for generating a strongly-ionized plasma are described. An apparatus for generating a strongly-ionized plasma according to the present invention includes an anode and a cathode that is positioned adjacent to the anode to form a gap there between. An ionization source generates a weakly-ionized plasma proximate to the cathode. A power supply produces an electric field in the gap between the anode and the cathode. The electric field generates excited atoms in the weakly-ionized plasma and generates secondary electrons from the cathode. The secondary electrons ionize the excited atoms, thereby creating the strongly-ionized plasma
Public/Granted literature
- US20040085023A1 Methods and apparatus for generating high-density plasma Public/Granted day:2004-05-06
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