发明授权
- 专利标题： Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby
- 专利标题（中）： 光刻投影装置，装置制造方法以及由此制造的装置
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申请号： US10641306申请日： 2003-08-15
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公开(公告)号： US06862075B2公开(公告)日： 2005-03-01
- 发明人: Norbertus Benedictus Koster , Bastiaan Matthias Mertens , Martinus Hendrikus Antonius Leenders , Vladimir Vital′evitch Ivanov , Konstantin Nikolaevitch Koshelev , Vadim Yevgenyevich Banine
- 申请人： Norbertus Benedictus Koster , Bastiaan Matthias Mertens , Martinus Hendrikus Antonius Leenders , Vladimir Vital′evitch Ivanov , Konstantin Nikolaevitch Koshelev , Vadim Yevgenyevich Banine
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop LLP
- 优先权： EP01300167 20010110
- 主分类号： B03C3/38
- IPC分类号： B03C3/38 ; G03F7/20 ; H01J27/02 ; H01J37/08 ; H01L21/027 ; G03B27/52 ; G03B27/42 ; G03B27/54
摘要：
Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.
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