公开(公告)号：US06862075B2

公开(公告)日：2005-03-01

申请号：US10641306

申请日：2003-08-15

申请人： Norbertus Benedictus Koster ,  Bastiaan Matthias Mertens ,  Martinus Hendrikus Antonius Leenders ,  Vladimir Vital′evitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine

发明人： Norbertus Benedictus Koster ,  Bastiaan Matthias Mertens ,  Martinus Hendrikus Antonius Leenders ,  Vladimir Vital′evitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine

IPC分类号： B03C3/38 ,  G03F7/20 ,  H01J27/02 ,  H01J37/08 ,  H01L21/027 ,  G03B27/52 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

摘要： Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.

摘要翻译： 在光刻投影装置中用投影光束行进的污染物颗粒被电离。 清洗气体可能被吸引到设置在净化气体供应源上游的吸气板。 磁场捕获由电离器产生的电子以改善净化气体的离子化。 可以通过在具有比宽度更大的长度的管中产生等离子体来使污染物颗粒离子化。

公开(公告)号：US06614505B2

公开(公告)日：2003-09-02

申请号：US10036497

申请日：2002-01-07

申请人： Norbertus Benedictus Koster ,  Bastiaan Matthias Mertens ,  Martinus Hendrikus Antonius Leenders ,  Vladimir Vital'evitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine

发明人： Norbertus Benedictus Koster ,  Bastiaan Matthias Mertens ,  Martinus Hendrikus Antonius Leenders ,  Vladimir Vital'evitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vadim Yevgenyevich Banine

IPC分类号： G03B2752

CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

摘要： Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.

公开(公告)号：US07279690B2

公开(公告)日：2007-10-09

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

IPC分类号： H05H3/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US06724460B2

公开(公告)日：2004-04-20

申请号：US09988830

申请日：2001-11-19

申请人： Willem Van Schaik ,  Antonie Ellert Duisterwinkel ,  Bastiaan Matthias Mertens ,  Hans Meiling ,  Norbertus Benedictus Koster

发明人： Willem Van Schaik ,  Antonie Ellert Duisterwinkel ,  Bastiaan Matthias Mertens ,  Hans Meiling ,  Norbertus Benedictus Koster

IPC分类号： G03B2752

CPC分类号： G03F7/70925

摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.

摘要翻译： 用于光刻投影装置的光学部件的原位清洁可以通过在分子氧的存在下用包含波长小于250nm的UV或EUV辐射在含有光学部件的装置内照射空间来进行。 通常，除了通常的清洗气体组合物之外，空间将被除去含有少量分子氧的无臭吹扫气体吹扫。 该技术也可以通过将低分子氧引入该空间而在真空空间中使用。

公开(公告)号：US07115886B2

公开(公告)日：2006-10-03

申请号：US10973250

申请日：2004-10-27

申请人： Willem Van Schaik ,  Bastiaan Matthias Mertens ,  Hans Meiling ,  Norbertus Benedictus Koster

发明人： Willem Van Schaik ,  Bastiaan Matthias Mertens ,  Hans Meiling ,  Norbertus Benedictus Koster

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 ,  G03F7/70883 ,  G03F7/70933

摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.

公开(公告)号：US06828569B2

公开(公告)日：2004-12-07

申请号：US09988391

申请日：2001-11-19

申请人： Willem Van Schaik ,  Bastiaan Matthias Mertens ,  Hans Meiling ,  Norbertus Benedictus Koster

发明人： Willem Van Schaik ,  Bastiaan Matthias Mertens ,  Hans Meiling ,  Norbertus Benedictus Koster

IPC分类号： G21G500

CPC分类号： G03F7/70925 ,  G03F7/70883 ,  G03F7/70933

摘要： Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons. Generally, the space will be purged with an ozone-less purge gas which contains a small amount of the oxygen-containing species in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of the oxygen-containing species into the space.

摘要翻译： 用于光刻投影装置的光学部件的清洁可以通过在选择的含氧物质的存在下，用波长小于250nm的UV或EUV辐射照射包含光学部件的装置内的空间来进行 来自水，氮氧化物和含氧烃。 通常，除了通常的吹扫气体组合物之外，空间将被含有少量含氧物质的无臭氧净化气体吹扫。 该技术也可以通过将含氧物质的低压引入空间而用于抽空空间。

公开(公告)号：US07491951B2

公开(公告)日：2009-02-17

申请号：US11319193

申请日：2005-12-28

申请人： Marc Hubertus Lorenz Van Der Velden ,  Vadim Yevgenyevich Banine ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Markus Weiss ,  Bastiaan Theodoor Wolschrijn ,  Michiel D. Nijkerk

发明人： Marc Hubertus Lorenz Van Der Velden ,  Vadim Yevgenyevich Banine ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Markus Weiss ,  Bastiaan Theodoor Wolschrijn ,  Michiel D. Nijkerk

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70916 ,  G03F7/7095

摘要： The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.

摘要翻译： 本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。 该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。 该装置还包括用于将背景气体提供到系统中的气体供应。 辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。 支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。

公开(公告)号：US07684012B2

公开(公告)日：2010-03-23

申请号：US11391731

申请日：2006-03-29

申请人： Johannes Henricus Wilhelmus Jacobs ,  Vadim Yevgenyevich Banine ,  Barrie Dudley Brewster ,  Vladimir Vitalevitch Ivanov ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Robert Gordon Livesey ,  Bastiaan Theodoor Wolschrijn

发明人： Johannes Henricus Wilhelmus Jacobs ,  Vadim Yevgenyevich Banine ,  Barrie Dudley Brewster ,  Vladimir Vitalevitch Ivanov ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Robert Gordon Livesey ,  Bastiaan Theodoor Wolschrijn

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.

摘要翻译： 光刻设备被配置为将图案从图案形成装置投影到基板上。 该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和 氩和氢的混合物。

公开(公告)号：US07248340B2

公开(公告)日：2007-07-24

申请号：US10874690

申请日：2004-06-24

申请人： Erik Leonardus Ham ,  Robert Gabriël Maria Lansbergen ,  Ellart Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Gert-Jan Heerens

发明人： Erik Leonardus Ham ,  Robert Gabriël Maria Lansbergen ,  Ellart Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Gert-Jan Heerens

IPC分类号： G03B27/42 ,  G03B27/62

CPC分类号： G03B27/52 ,  G03F7/70741

摘要： A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.

摘要翻译： 提出了用于传送平版印刷图案形成装置的传送箱和适于与传送箱配合的光刻设备。 输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。 该箱还包括用于封闭开口的封闭部分，以及用于将气体从箱体内部空间排出和/或送入箱体的内部空间的通道系统。

公开(公告)号：US07151589B2

公开(公告)日：2006-12-19

申请号：US10972755

申请日：2004-10-26

申请人： Erik Leonardus Ham ,  Gert-Jan Heerens ,  Robert Gabriël Maria Lansbergen ,  Ellard Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors

发明人： Erik Leonardus Ham ,  Gert-Jan Heerens ,  Robert Gabriël Maria Lansbergen ,  Ellard Alexander Meijer ,  Hendricus Johannes Maria Meijer ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/32 ,  G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70741

摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.

摘要翻译： 根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。 运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。 在将图案形成装置从内部空间传送到装置之前，内部空间被加压。 箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。 其他实施例包括包括和/或配置为与这种盒配合的光刻设备。