Invention Grant
- Patent Title: Apparatus and process for film deposition
- Patent Title (中): 用于膜沉积的装置和方法
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Application No.: US10066380Application Date: 2002-02-05
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Publication No.: US06875478B2Publication Date: 2005-04-05
- Inventor: Masato Yoshikawa , Yoshinori Iwabuchi , Shingo Ohno , Yukihiro Kusano
- Applicant: Masato Yoshikawa , Yoshinori Iwabuchi , Shingo Ohno , Yukihiro Kusano
- Applicant Address: JP Tokyo
- Assignee: Bridgestone Corporation
- Current Assignee: Bridgestone Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2001-030061 20010206
- Main IPC: C23C14/20
- IPC: C23C14/20 ; C23C14/56 ; D06M11/00 ; D06M11/83 ; B05D1/04 ; C23C14/00 ; C23C16/00

Abstract:
A film deposition apparatus equipped with a vacuum chamber, comprising a pair of rollers for vertically traveling a continuous sheet as a substrate, and a pair of sputtering cathodes for continuously depositing the film on the surfaces of the sheet in the vacuum chamber. The cathodes are vertically arranged and horizontally faced each other. The sheet is traveled between a pair of the cathodes. The apparatus and the film deposition process using it make it possible to deposit a film even on surfaces of a flexible sheet without causing problems such as defective film deposition or abnormal discharge, while ensuring stable, continuous, long-term operation.
Public/Granted literature
- US20020144656A1 Apparatus and process for film deposition Public/Granted day:2002-10-10
Information query
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