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    Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves
    6.
    发明授权
    Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves 有权
    使用高强度和高功率超声波增强等离子体表面改性

    公开(公告)号：US08399795B2

    公开(公告)日：2013-03-19

    申请号：US12599775

    申请日：2008-05-09

    Applicant: Niels Krebs ,  Alexander Bardenshtein ,  Yukihiro Kusano ,  Henrik Bindslev ,  Henrik Junge Mortensen

    Inventor： Niels Krebs ,  Alexander Bardenshtein ,  Yukihiro Kusano ,  Henrik Bindslev ,  Henrik Junge Mortensen

    IPC: H05H1/24 ,  B08B6/00 ,  H05F3/00 ,  A61F2/00 ,  C23F1/00

    CPC classification number: H01J37/32321 ,  C23C16/4415 ,  H05H1/2475 ,  H05H2001/2493 ,  Y10T428/31

    Abstract: This invention relates to a plasma surface modification process (and a corresponding a system) of a solid object (100) comprising creating plasma (104) by a plasma source (106), application of the plasma (104) to at least a part of a surface (314) of the solid object (100), generating ultrasonic high intensity and high power acoustic waves (102) by at least one ultrasonic high intensity and high power acoustic wave generator (101), wherein the ultrasonic acoustic waves are directed to propagate towards said surface (314) of the object (100) so that a laminar boundary layer (313) of a gas or a mixture of gases (500) flow in contact with said solid object (100) is thinned or destructed for at least a part of said surface (314). In this way, the plasma can more efficiently access and influence the surface of the solid object to be treated by the plasma, which speeds the process time up significantly.

    Abstract translation: 本发明涉及固体物体（100）的等离子体表面改性方法（和相应的系统），包括通过等离子体源（106）产生等离子体（104），将等离子体（104）施加至至少一部分 固体物体（100）的表面（314），通过至少一个超声波高强度和高功率声波发生器（101）产生超声波高强度和高功率声波（102），其中超声波被引导到 朝向物体（100）的所述表面（314）传播，使得与所述固体物体（100）流动的气体或气体混合物（500）的层流边界层（313）被稀释或破坏至少 所述表面（314）的一部分。 以这种方式，等离子体可以更有效地访问并影响待等待处理的固体物体的表面，这显着地加快了处理时间。

    Apparatus and process for film deposition
    7.
    发明授权
    Apparatus and process for film deposition 失效
    用于膜沉积的装置和方法

    公开(公告)号：US06875478B2

    公开(公告)日：2005-04-05

    申请号：US10066380

    申请日：2002-02-05

    Applicant: Masato Yoshikawa ,  Yoshinori Iwabuchi ,  Shingo Ohno ,  Yukihiro Kusano

    Inventor： Masato Yoshikawa ,  Yoshinori Iwabuchi ,  Shingo Ohno ,  Yukihiro Kusano

    IPC: C23C14/20 ,  C23C14/56 ,  D06M11/00 ,  D06M11/83 ,  B05D1/04 ,  C23C14/00 ,  C23C16/00

    CPC classification number: C23C14/562

    Abstract: A film deposition apparatus equipped with a vacuum chamber, comprising a pair of rollers for vertically traveling a continuous sheet as a substrate, and a pair of sputtering cathodes for continuously depositing the film on the surfaces of the sheet in the vacuum chamber. The cathodes are vertically arranged and horizontally faced each other. The sheet is traveled between a pair of the cathodes. The apparatus and the film deposition process using it make it possible to deposit a film even on surfaces of a flexible sheet without causing problems such as defective film deposition or abnormal discharge, while ensuring stable, continuous, long-term operation.

    Abstract translation: 一种装有真空室的成膜装置，包括用于垂直行进连续片材作为基底的一对辊子和用于在真空室中在片材表面上连续沉积薄膜的一对溅射阴极。 阴极垂直布置并水平面对。 片材在一对阴极之间行进。 使用它的装置和成膜方法使得可以在柔性片的表面上沉积膜，而不会导致诸如膜沉积错误或异常放电的问题，同时确保稳定，连续的长期操作。

    Formation of metal compound thin film and preparation of rubber composite material
    8.
    发明授权
    Formation of metal compound thin film and preparation of rubber composite material 失效
    金属化合物薄膜的形成和橡胶复合材料的制备

    公开(公告)号：US06468401B1

    公开(公告)日：2002-10-22

    申请号：US08634792

    申请日：1996-04-19

    Applicant: Masato Yoshikawa ,  EngKean Sim ,  Hideo Sugiyama ,  Yukihiro Kusano ,  Kazuo Naito

    Inventor： Masato Yoshikawa ,  EngKean Sim ,  Hideo Sugiyama ,  Yukihiro Kusano ,  Kazuo Naito

    IPC: C23C1434

    CPC classification number: C23C14/548 ,  C23C14/0036

    Abstract: A thin film of a metal compound such as metal oxide, nitride and carbide is formed on a substrate by sputtering a target in vacuum in the presence of an inert gas and a reactive gas. From a curve of an input power supplied from a DC supply to the target versus an input voltage between the target and the substrate, a transition point of input power at which an abrupt change of the input voltage occurs is determined. The input power during sputtering is controlled using the transition point as a reference, thereby controlling the composition or physical properties of the thin film. When a cobalt oxide thin film is formed on a substrate in this way, rubber can be vulcanized thereto to form a firm bond.

    Abstract translation: 在惰性气体和反应气体的存在下，通过在真空中溅射靶，在基板上形成金属化合物如金属氧化物，氮化物和碳化物的薄膜。 根据从直流电源提供给目标的输入功率与目标和基板之间的输入电压的曲线，确定输入电压发生突然变化的输入功率的转变点。 使用转变点作为参考，控制溅射期间的输入功率，从而控制薄膜的组成或物理性质。 当以这种方式在基板上形成氧化钴薄膜时，可以将橡胶硫化以形成牢固的粘结。

    Process for surface treatment of vulcanized rubber and process for production of rubber-based composite material
    9.
    发明授权
    Process for surface treatment of vulcanized rubber and process for production of rubber-based composite material 失效
    硫化橡胶表面处理工艺及橡胶基复合材料生产工艺

    公开(公告)号：US6013153A

    公开(公告)日：2000-01-11

    申请号：US60255

    申请日：1998-04-15

    Applicant: Hideomi Koinuma ,  Yukihiro Kusano ,  Masato Yoshikawa ,  Nobuko Kato ,  Kazuo Naito

    Inventor： Hideomi Koinuma ,  Yukihiro Kusano ,  Masato Yoshikawa ,  Nobuko Kato ,  Kazuo Naito

    IPC: B29C59/10 ,  B29C59/12 ,  H05H1/46 ,  B32B31/20

    CPC classification number: B29C59/106 ,  B29C59/12 ,  H05H1/46 ,  B29C2059/145 ,  B29K2021/00

    Abstract: A process for surface treatment of a vulcanized rubber is disclosed, said process comprising: generating a nonequilibrium low-temperature plasma under atmospheric pressure between a cathode and an insulating dielectric which is interposed between the cathode and an anode while introducing a gas for generating plasma to a plasma-generating region between the cathode and the insulating dielectric, placing the vulcanized rubber in air and outside the plasma-generating region so that a surface of the vulcanized rubber faces the plasma-generating region, and directing the gas from the plasma-generating region toward the surface of the vulcanized rubber so that the gas impinges against the rubber surface for effecting surface treatment.

    Abstract translation: 公开了一种用于表面处理硫化橡胶的方法，所述方法包括：在阴极和绝缘电介质之间的大气压下产生非平衡低温等离子体，该阴极和绝缘电介质介于阴极和阳极之间，同时引入用于产生等离子体的气体 在阴极和绝缘电介质之间的等离子体产生区域，将硫化橡胶放置在空气中并在等离子体产生区域外部，使得硫化橡胶的表面面对等离子体产生区域，并引导来自等离子体产生区域的气体 区域朝向硫化橡胶的表面，使得气体撞击橡胶表面进行表面处理。

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