发明授权
- 专利标题： Attenuated embedded phase shift photomask blanks
- 专利标题（中）： 嵌入式相移光掩模空白
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申请号： US10727925申请日： 2003-12-04
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公开(公告)号： US06979518B2公开(公告)日： 2005-12-27
- 发明人: Marie Angelopoulos , Katherina Babich , S. Jay Chey , Michael Straight Hibbs , Robert N. Lang , Arpan Pravin Mahorowala , Kenneth Christopher Racette
- 申请人： Marie Angelopoulos , Katherina Babich , S. Jay Chey , Michael Straight Hibbs , Robert N. Lang , Arpan Pravin Mahorowala , Kenneth Christopher Racette
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Scully, Scott, Murphy & Presser
- 代理商 Daniel P. Morris, Esq.
- 主分类号： G03F1/32
- IPC分类号： G03F1/32 ; C23C14/06 ; C23C14/08 ; H01L21/027 ; G03F9/00
摘要：
An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of optical transmission (0.001% up to 15% at 157 nm) is obtained by this process.
公开/授权文献
- US20040170907A1 Attenuated embedded phase shift photomask blanks 公开/授权日：2004-09-02