Invention Grant
- Patent Title: Bidirectional photothyristor chip
- Patent Title (中): 双向光电晶体管芯片
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Application No.: US10732459Application Date: 2003-12-11
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Publication No.: US06995408B2Publication Date: 2006-02-07
- Inventor: Mitsuru Mariyama , Masaru Kubo
- Applicant: Mitsuru Mariyama , Masaru Kubo
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Morrison & Foerster LLP
- Priority: JPP2002-366635 20021218
- Main IPC: H01L29/74
- IPC: H01L29/74 ; H01L31/111

Abstract:
A Schottky barrier diode 44 is formed between a P-gate diffusion region 33 and an N-type silicon substrate 31 in a photothyristor on a CH1 side and a photothyristor on a CH2 side. With this arrangement, the injection of minority carriers from the P-gate diffusion region 33 to the N-type silicon substrate 31 is restrained to reduce the amount of remaining carriers, and an excessive amount of carriers remaining in the N-type silicon substrate 31 during commutation has a reduced chance of moving toward the opposite channel side, allowing the commutation characteristic to be improved. Therefore, by a combination with an LED, there can be provided a light-fired coupler for firing and controlling the load.
Public/Granted literature
- US20040262633A1 Bidirectional photothyristor chip Public/Granted day:2004-12-30
Information query
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