- 专利标题: Control system for a two chamber gas discharge laser
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申请号: US10631349申请日: 2003-07-30
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公开(公告)号: US07039086B2公开(公告)日: 2006-05-02
- 发明人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
- 申请人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
- 申请人地址: US CA San Diego
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego
- 代理机构: Cymer, Inc.
- 代理商 William C. Cray
- 主分类号: H01S3/22
- IPC分类号: H01S3/22
摘要:
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
公开/授权文献
- US20040057489A1 Control system for a two chamber gas discharge laser 公开/授权日:2004-03-25