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公开(公告)号:US07039086B2
公开(公告)日:2006-05-02
申请号:US10631349
申请日:2003-07-30
申请人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号: H01S3/22
CPC分类号: H01S3/225 , G03F7/70025 , G03F7/70041 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/0381 , H01S3/09702 , H01S3/1055 , H01S3/2258 , H01S3/2333
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
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公开(公告)号:US06690704B2
公开(公告)日:2004-02-10
申请号:US10210761
申请日:2002-07-31
申请人: John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人: John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号: H01S322
CPC分类号: H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 提供了反馈定时控制技术,即使在脉冲串模式操作中,也可以精确地控制两个室中的放电的相对定时,其精确度在大约2至50亿分之一秒的范围内。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。
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公开(公告)号:USRE42588E1
公开(公告)日:2011-08-02
申请号:US11352522
申请日:2006-02-10
申请人: John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人: John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号: H01S3/22
CPC分类号: H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 提供了反馈定时控制技术,即使在脉冲串模式操作中,也可以精确地控制两个室中的放电的相对定时,其精确度在大约2至50亿分之一秒的范围内。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。
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公开(公告)号:US07596164B2
公开(公告)日:2009-09-29
申请号:US11376364
申请日:2006-03-15
申请人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号: H01S3/223
CPC分类号: H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制特征包括:(1)脉冲能量控制,具有纳秒定时精度(2)精确脉冲到脉冲波长控制,具有高速和极速波长调谐(3)快速响应气体 温度控制和(4)F2注入控制与新的学习算法。
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公开(公告)号:US07079564B2
公开(公告)日:2006-07-18
申请号:US11181258
申请日:2005-07-14
申请人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号: H01S3/22
CPC分类号: H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制特征包括:(1)脉冲能量控制,具有纳秒定时精度(2)精确脉冲到脉冲波长控制,具有高速和极速波长调谐(3)快速响应气体 温度控制和(4)F 2注入控制与新的学习算法。
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公开(公告)号:US06963595B2
公开(公告)日:2005-11-08
申请号:US10356168
申请日:2003-01-31
申请人: John A. Rule , Richard C. Morton , Vladimir V. Fleurov , Fedor Trintchouk , Toshihiko Ishihara , Alexander I. Ershov , James A. Carmichael
发明人: John A. Rule , Richard C. Morton , Vladimir V. Fleurov , Fedor Trintchouk , Toshihiko Ishihara , Alexander I. Ershov , James A. Carmichael
IPC分类号: H01L21/027 , G03F7/20 , H01S20060101 , H01S3/036 , H01S3/041 , H01S3/08 , H01S3/134 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号: H01S3/225 , G03F7/70025 , H01S3/036 , H01S3/041 , H01S3/08009 , H01S3/09702 , H01S3/2258 , H01S3/2333
摘要: An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.
摘要翻译: 用于模块化高重复率紫外线气体放电激光器的自动F 2激光气体控制。 激光气体控制包括技术,监视器和处理器,用于在激光系统的使用寿命期间监视F 2消耗率。 这些消耗速率由用算法编程的处理器用于确定在输送范围内保持激光束质量所需的F 2注射。 优选实施例包括用于两室MOPA激光系统的F 2控制。
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公开(公告)号:US06650666B2
公开(公告)日:2003-11-18
申请号:US10027210
申请日:2001-12-21
申请人: Ronald L. Spangler , Robert N. Jacques , John A. Rule , Frederick A. Palenschat , Igor V. Fomenkov , John M. Algots , Jacob P. Lipcon , Richard L. Sandstrom
发明人: Ronald L. Spangler , Robert N. Jacques , John A. Rule , Frederick A. Palenschat , Igor V. Fomenkov , John M. Algots , Jacob P. Lipcon , Richard L. Sandstrom
IPC分类号: H01S310
CPC分类号: G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide (1) fast feedback control based on wavelength measurements, (2) fast vibration control, (3) active damping using the load cell and an active damping module, (4) transient inversion using feed forward algorithms based on historical burst data. A preferred embodiment adapts the feed forward algorithms to current conditions. Another preferred embodiment measures tuning mirror position to permit wavelength pretuning and active wavelength tuning.
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8.
公开(公告)号:US20160149239A1
公开(公告)日:2016-05-26
申请号:US14755982
申请日:2015-06-30
申请人: John A. Rule , Jacob P. Lipcon , Armin B. Kusig , John P. Fallon
发明人: John A. Rule , Jacob P. Lipcon , Armin B. Kusig , John P. Fallon
IPC分类号: H01M8/04537 , H01M8/1246 , H01M8/04828 , H01M8/04223 , H01M8/0432 , H01M8/04089
CPC分类号: H01M8/04223 , H01M8/04089 , H01M8/0432 , H01M8/04619 , H01M8/04925 , H01M16/006 , H01M2008/1293 , H01M2250/30 , Y02B90/18
摘要: A portable fuel cell system includes a fuel cell having a plurality of flow inputs and a power output, a temperature sensor configured to measure operating temperature of the fuel cell, a power output sensor coupled to the fuel cell and configured to measure a power parameter related to fuel cell power output, a controllable power converter, coupled to the power output of the fuel cell, that transfers power from the fuel cell to the fuel cell system, and a flow control device coupled to a first flow input and configured to control a first one of the flow inputs into the fuel cell. The system further includes a fuel cell system controller, coupled to the fuel cell, the power output, the temperature sensor, the power output sensor, the controllable power converter, and the flow control device.
摘要翻译: 便携式燃料电池系统包括具有多个流量输入和功率输出的燃料电池,配置成测量燃料电池的工作温度的温度传感器,耦合到燃料电池的功率输出传感器,并被配置为测量相关的功率参数 燃料电池功率输出,耦合到燃料电池的功率输出的可控功率转换器,其将来自燃料电池的功率传递到燃料电池系统;以及流量控制装置,其耦合到第一流量输入并被配置为控制 进入燃料电池的第一个流量输入。 该系统还包括燃料电池系统控制器,其耦合到燃料电池,功率输出,温度传感器,功率输出传感器,可控电力转换器和流量控制装置。
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公开(公告)号:US06853653B2
公开(公告)日:2005-02-08
申请号:US10036925
申请日:2001-12-21
申请人: Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人: Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号: B41C20060101 , B41C1/00 , G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01J3/10
CPC分类号: G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
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公开(公告)号:US07382815B2
公开(公告)日:2008-06-03
申请号:US10915517
申请日:2004-08-09
申请人: Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人: Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号: H01S5/00
CPC分类号: G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译: 一种称为光电工程的集成电路光刻技术,用于放电激光器的带宽控制。 在优选的方法中,使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。 然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长,以实现接近所需激光光谱的脉冲串的集成光谱。 控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱,以便在光致抗蚀剂膜中产生改进的图案分辨率。 提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。 在优选实施例中,波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。 在一种情况下,用方波信号驱动压电驱动,在第二种情况下,它是用正弦波信号驱动的。 在另一个实施例中,最大位移与激光脉冲在一对一的基础上匹配,以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。 其它优选实施例利用三个独立的波长调谐位置,产生具有三个独立峰值的光谱。
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