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公开(公告)号:US07039086B2
公开(公告)日:2006-05-02
申请号:US10631349
申请日:2003-07-30
申请人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人: John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号: H01S3/22
CPC分类号: H01S3/225 , G03F7/70025 , G03F7/70041 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/0381 , H01S3/09702 , H01S3/1055 , H01S3/2258 , H01S3/2333
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
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公开(公告)号:US20060209917A1
公开(公告)日:2006-09-21
申请号:US11376364
申请日:2006-03-15
申请人: John Fallon , John Rule , Robert Jacques , Jacob Lipcon , William Partlo , Alexander Ershov , Toshihiko Ishihara , John Meisner , Richard Ness , Paul Melcher
发明人: John Fallon , John Rule , Robert Jacques , Jacob Lipcon , William Partlo , Alexander Ershov , Toshihiko Ishihara , John Meisner , Richard Ness , Paul Melcher
CPC分类号: H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
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公开(公告)号:US20050265417A1
公开(公告)日:2005-12-01
申请号:US11181258
申请日:2005-07-14
申请人: John Fallon , John Rule , Robert Jacques , Jacob Lipcon , William Partlo , Alexander Ershov , Toshihiko Ishihara , John Meisner , Richard Ness , Paul Melcher
发明人: John Fallon , John Rule , Robert Jacques , Jacob Lipcon , William Partlo , Alexander Ershov , Toshihiko Ishihara , John Meisner , Richard Ness , Paul Melcher
IPC分类号: H01S3/00 , H01S3/08 , H01S3/0971 , H01S3/0975 , H01S3/1055 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号: H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中,激光器是具有主振荡器的生产线机器,该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制特征包括:(1)脉冲能量控制,具有纳秒定时精度(2)精确脉冲到脉冲波长控制,具有高速和极速波长调谐(3)快速响应气体 温度控制和(4)F 2注入控制与新的学习算法。
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公开(公告)号:US20050068997A1
公开(公告)日:2005-03-31
申请号:US10915517
申请日:2004-08-09
申请人: Ronald Spangler , Jacob Lipcon , John Rule , Robert Jacques , Armen Kroyan , Ivan Lalovic , Igor Fomenkov , John Algots
发明人: Ronald Spangler , Jacob Lipcon , John Rule , Robert Jacques , Armen Kroyan , Ivan Lalovic , Igor Fomenkov , John Algots
IPC分类号: B41C20060101 , B41C1/00 , G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号: G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
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公开(公告)号:US20050041701A1
公开(公告)日:2005-02-24
申请号:US10912933
申请日:2004-08-05
申请人: Ronald Spangler , Jacob Lipcon , John Rule , Robert Jacques , Armen Kroyan , Ivan Lalovic , Igor Fomenkov , John Algots
发明人: Ronald Spangler , Jacob Lipcon , John Rule , Robert Jacques , Armen Kroyan , Ivan Lalovic , Igor Fomenkov , John Algots
IPC分类号: B41C20060101 , B41C1/00 , G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号: G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译: 一种称为光电工程的集成电路光刻技术,用于放电激光器的带宽控制。 在优选的方法中,使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。 然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长,以实现接近所需激光光谱的脉冲串的集成光谱。 控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱,以便在光致抗蚀剂膜中产生改进的图案分辨率。 提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。 在优选实施例中,波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。 在一种情况下,用方波信号驱动压电驱动,在第二种情况下,它是用正弦波信号驱动的。 在另一个实施例中,最大位移与激光脉冲在一对一的基础上匹配,以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。 其它优选实施例利用三个独立的波长调谐位置,产生具有三个独立峰值的光谱。
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