Invention Grant
- Patent Title: Production method for compound semiconductor single crystal
- Patent Title (中): 化合物半导体单晶的制备方法
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Application No.: US10502228Application Date: 2002-12-17
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Publication No.: US07229494B2Publication Date: 2007-06-12
- Inventor: Toshiaki Asahi , Kenji Sato , Atsutoshi Arakawa
- Applicant: Toshiaki Asahi , Kenji Sato , Atsutoshi Arakawa
- Applicant Address: JP Tokyo
- Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2002-035551 20020213; JP2002-208530 20020717; JP2002-249963 20020829
- International Application: PCT/JP02/13165 WO 20021217
- International Announcement: WO03/068696 WO 20030821
- Main IPC: C30B15/20
- IPC: C30B15/20

Abstract:
A method for producing a compound semiconductor single crystal by a liquid encapsulated Czochralski method, including containing a semiconductor raw material and an encapsulating material in a raw material melt-containing portion having a first crucible having a bottom and a cylindrical shape and a second crucible disposed within the first crucible and having a communication hole communicating with the first crucible in a bottom portion thereof; melting the raw material by heating the raw material melt-containing portion; and growing a crystal by making a seed crystal contact with a surface of the raw material melt in a state covered with the encapsulating material and by pulling up the seed crystal. A heater temperature is controlled so that a diameter of a growing crystal becomes approximately equal to an inner diameter of the second crucible, and the crystal is grown by maintaining a surface of the growing crystal in a state covered with the encapsulating material until termination of crystal growth.
Public/Granted literature
- US20050118739A1 Production method for compound semiconductor single crystal Public/Granted day:2005-06-02
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