发明授权
US07361993B2 Terminal pad structures and methods of fabricating same 有权
端子焊盘结构及其制造方法

Terminal pad structures and methods of fabricating same
摘要:
Terminal pads and methods of fabricating terminal pads. The methods including forming a conductive diffusion barrier under a conductive pad in or overlapped by a passivation layer comprised of multiple dielectric layers including diffusion barrier layers. The methods including forming the terminal pads subtractively or by a damascene process.
公开/授权文献
信息查询
0/0