发明授权
US07459699B2 Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method
有权
确定带电粒子束装置的加工位置的方法和该方法中使用的红外显微镜
- 专利标题: Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method
- 专利标题(中): 确定带电粒子束装置的加工位置的方法和该方法中使用的红外显微镜
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申请号: US11286684申请日: 2005-11-23
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公开(公告)号: US07459699B2公开(公告)日: 2008-12-02
- 发明人: Masahiro Kiyohara , Makoto Sato , Tatsuya Asahata
- 申请人: Masahiro Kiyohara , Makoto Sato , Tatsuya Asahata
- 申请人地址: JP Chiba
- 专利权人: SII NanoTechnology Inc.
- 当前专利权人: SII NanoTechnology Inc.
- 当前专利权人地址: JP Chiba
- 代理机构: Brinks Hofer Gilson & Lione
- 优先权: JP2004-341729 20041126
- 主分类号: G01J1/00
- IPC分类号: G01J1/00 ; G01N21/00 ; G01N23/00
摘要:
A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the charged particle beam apparatus so as to come into the view field while performing an observation by an infrared microscope, and by a using a laser optical system disposed coaxially with an optical observation system, the mark made at the periphery of the processing/observation object area. Next, by a superposition of an infrared transmission image and a CAD data, the processing/observation object area and the laser mark are registered onto the CAD data. And, by a correlation of the registered data read from the charged particle beam apparatus and the secondary charged particle image, it is possible to accurately and easily determine the processing position.
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