公开(公告)号：US07459699B2

公开(公告)日：2008-12-02

申请号：US11286684

申请日：2005-11-23

申请人： Masahiro Kiyohara ,  Makoto Sato ,  Tatsuya Asahata

发明人： Masahiro Kiyohara ,  Makoto Sato ,  Tatsuya Asahata

IPC分类号： G01J1/00 ,  G01N21/00 ,  G01N23/00

CPC分类号： G01N23/225 ,  H01J2237/317

摘要： A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the charged particle beam apparatus so as to come into the view field while performing an observation by an infrared microscope, and by a using a laser optical system disposed coaxially with an optical observation system, the mark made at the periphery of the processing/observation object area. Next, by a superposition of an infrared transmission image and a CAD data, the processing/observation object area and the laser mark are registered onto the CAD data. And, by a correlation of the registered data read from the charged particle beam apparatus and the secondary charged particle image, it is possible to accurately and easily determine the processing position.

摘要翻译： 作为带电粒子束装置中的二次带电粒子图像的定位标记的激光标记是通过移动带电粒子束装置中的样品处理/观察区域进行观察的场所，同时进行观察 通过使用与光学观察系统同轴设置的激光光学系统，在处理/观察对象区域的周围形成标记。 接下来，通过红外透射图像和CAD数据的叠加，将处理/观察对象区域和激光标记登记在CAD数据上。 并且，通过从带电粒子束装置读取的登录数据与二次带电粒子图像的相关性，可以准确且容易地确定处理位置。

公开(公告)号：US20060118733A1

公开(公告)日：2006-06-08

申请号：US11286684

申请日：2005-11-23

申请人： Masahiro Kiyohara ,  Makoto Sato ,  Tatsuya Asahata

发明人： Masahiro Kiyohara ,  Makoto Sato ,  Tatsuya Asahata

IPC分类号： G01N23/00

CPC分类号： G01N23/225 ,  H01J2237/317

摘要： A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the charged particle beam apparatus so as to come into the view field while performing an observation by an infrared microscope, and by a using a laser optical system disposed coaxially with an optical observation system, the mark made at the periphery of the processing/observation object area. Next, by a superposition of an infrared transmission image and a CAD data, the processing/observation object area and the laser mark are registered onto the CAD data. And, by a correlation of the registered data read from the charged particle beam apparatus and the secondary charged particle image, it is possible to accurately and easily determine the processing position.

摘要翻译： 作为带电粒子束装置中的二次带电粒子图像的定位标记的激光标记是通过移动带电粒子束装置中的样品处理/观察区域进行观察的场所，同时进行观察 通过使用与光学观察系统同轴设置的激光光学系统，在处理/观察对象区域的周围形成标记。 接下来，通过红外透射图像和CAD数据的叠加，将处理/观察对象区域和激光标记登记在CAD数据上。 并且，通过从带电粒子束装置读取的登录数据与二次带电粒子图像的相关性，可以准确且容易地确定处理位置。

公开(公告)号：US08426830B2

公开(公告)日：2013-04-23

申请号：US12613107

申请日：2009-11-05

申请人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

发明人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

IPC分类号： G21G4/00

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/304 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/30416 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.

摘要翻译： 聚焦离子束装置包括：聚焦离子束照射机构，被配置为用聚焦离子束照射样品; 检测器，被配置为检测通过用所述聚焦光束照射所述样品而产生的二次带电粒子; 图像生成单元，被配置为生成样本的样本图像; 处理区域设定单元，被配置为将包括与所述聚焦离子束的照射位置对应的多个像素的处理区域图像设置在所述样本图像上; 被配置为设置包括在处理区域图像中的像素的坐标的照射设置单元的位置; 光束设定单元，被配置为根据强度设定从所述聚焦离子束照射机构照射的聚焦离子束的剂量; 以及被配置为对所述处理区域图像执行内插处理的内插单元。

公开(公告)号：US20100155624A1

公开(公告)日：2010-06-24

申请号：US12613107

申请日：2009-11-05

申请人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

发明人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

IPC分类号： H01J37/08 ,  G21K5/04

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/304 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/30416 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.

摘要翻译： 聚焦离子束装置包括：聚焦离子束照射机构，被配置为用聚焦离子束照射样品; 检测器，被配置为检测通过用所述聚焦光束照射所述样品而产生的二次带电粒子; 图像生成单元，被配置为生成样本的样本图像; 处理区域设定单元，被配置为将包括与所述聚焦离子束的照射位置对应的多个像素的处理区域图像设置在所述样本图像上; 被配置为设置包括在处理区域图像中的像素的坐标的照射设置单元的位置; 光束设定单元，被配置为根据强度设定从所述聚焦离子束照射机构照射的聚焦离子束的剂量; 以及被配置为对所述处理区域图像执行内插处理的内插单元。

公开(公告)号：US08542275B2

公开(公告)日：2013-09-24

申请号：US12880626

申请日：2010-09-13

申请人： Masahiro Kiyohara ,  Makoto Sato ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Masahiro Kiyohara ,  Makoto Sato ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： H04N7/18

CPC分类号： G01N23/2255

摘要： A cross-section processing and observation method includes: forming a first cross section in a sample by etching processing using a focused ion beam; obtaining image information of the first cross section by irradiating the focused ion beam to the first cross section; forming a second cross section by performing etching processing on the first cross section; obtaining image information of the second cross section by irradiating the focused ion beam to an irradiation region including the second cross section; displaying image information of a part of a display region of the irradiation region from the image information of the second cross section; displaying the image information of the first cross section by superimposing it on the image information being displayed; and moving the display region within the irradiation region. Observation images in which display regions are aligned can be obtained while reducing damage to the sample.

摘要翻译： 截面处理和观察方法包括：通过使用聚焦离子束的蚀刻处理在样品中形成第一横截面; 通过将聚焦的离子束照射到第一横截面来获得第一横截面的图像信息; 通过对所述第一横截面进行蚀刻处理形成第二横截面; 通过将聚焦离子束照射到包括第二横截面的照射区域来获得第二横截面的图像信息; 从第二横截面的图像信息中显示照射区域的显示区域的一部分的图像信息; 通过将第一横截面的图像信息叠加在正在显示的图像信息上来显示图像信息; 并且在照射区域内移动显示区域。 可以获得显示区域对准的观察图像，同时减少对样品的损伤。

公开(公告)号：US20110052044A1

公开(公告)日：2011-03-03

申请号：US12873886

申请日：2010-09-01

申请人： Haruo Takahashi ,  Masahiro Kiyohara ,  Makoto Sato ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Masahiro Kiyohara ,  Makoto Sato ,  Junichi Tashiro

IPC分类号： G06T7/00

CPC分类号： G01N23/2255 ,  H01J2237/221

摘要： A cross-section processing and observation method includes: forming a cross section in a sample by a focused ion beam through etching processing; obtaining a cross-section observation image through cross-section observation by the focused ion beam; and forming a new cross section by performing etching processing in a region including the cross section and obtaining a cross-section observation image of the new cross section. A surface observation image of a region including a mark on the sample and the cross section is obtained. A position of the mark is recognized in the surface observation image and etching processing is performed on the cross section by setting, in reference to the position of the mark, a focused ion beam irradiation region in which to form the new cross section. Cross-section processing and observation is thus enabled continuously and efficiently using a focused ion beam apparatus having no SEM apparatus.

摘要翻译： 截面处理和观察方法包括：通过蚀刻处理通过聚焦离子束在样品中形成横截面; 通过聚焦离子束的横截面观察获得横截面观察图像; 并且通过在包括横截面的区域中进行蚀刻处理并获得新横截面的横截面观察图像来形成新的横截面。 获得包括样品上的标记和横截面的区域的表面观察图像。 在表面观察图像中识别标记的位置，并且通过关于标记的位置设置形成新横截面的聚焦离子束照射区域来对截面进行蚀刻处理。 因此，使用不具有SEM装置的聚焦离子束装置，能够连续有效地进行横截面加工和观察。

公开(公告)号：US09625037B2

公开(公告)日：2017-04-18

申请号：US14726042

申请日：2015-05-29

申请人： Raymond Young ,  Marc Maloney ,  Roger Brown ,  Makoto Sato

发明人： Raymond Young ,  Marc Maloney ,  Roger Brown ,  Makoto Sato

IPC分类号： F16J15/02 ,  B65H45/02 ,  B60J10/00 ,  B60P3/34

CPC分类号： F16J15/027 ,  B60J10/00 ,  B60P3/34 ,  B65H45/02

摘要： A seal useful in sealing slide out rooms used in recreational vehicles. The seal may be used singularly or in pairs to straddle a wall through which the opening is located. A bulb is attached to the base in a cantilevered manner over the base. The bulb has an outer arcuate portion that is integrally joined to opposing sidewall portions. The sidewall portions extend into an inner wall that defines an enclosed space within the bulb portion. The bulb portion may also have a protrusion that can touch the base. A wiper extends from the base substantially co-linearly to the base and opposite the offsetting member. A locating leg extending from the base is movable between a first position and a second position. The first position has the locating leg perpendicular to the base and the second position places the locating leg parallel to the base.

公开(公告)号：US09245659B2

公开(公告)日：2016-01-26

申请号：US13937268

申请日：2013-07-09

申请人： Osamu Tsujii ,  Makoto Sato ,  Masahiko Okunuki ,  Satoshi Shimizu ,  Takashi Ogura

发明人： Osamu Tsujii ,  Makoto Sato ,  Masahiko Okunuki ,  Satoshi Shimizu ,  Takashi Ogura

IPC分类号： G21K1/04 ,  A61B6/06 ,  A61B6/00

CPC分类号： G21K1/04 ,  A61B6/06 ,  A61B6/4007 ,  A61B6/4405 ,  A61B6/4441 ,  A61B6/587 ,  G21K1/046 ,  H01J2235/068

摘要： An X-ray imaging apparatus is provided with a multi X-ray source and a collimator in which a plurality of slits for X-rays to pass through are two-dimensionally formed, the size and position of the slits being adjustable. A control unit, as a first control mode, controls the size and position of the slits to move an examination region in parallel, when an X-ray source is changed to a different X-ray source, such that the examination directions are parallel before and after the change. Also, the control unit, as a second control mode, controls the size and position of the slits to rotate the examination direction, when an X-ray source is changed to a different X-ray source, such that the center of the examination regions is the same before and after the change.

公开(公告)号：US20140076647A1

公开(公告)日：2014-03-20

申请号：US14009471

申请日：2012-01-27

申请人： Makoto Sato ,  Yujiro Sawasaki ,  Keiji Ito ,  Miyahito Hase ,  Hidehiko Makida ,  Makoto Morishima ,  Hiromasa Nishino ,  Yorikata Mizokami

发明人： Makoto Sato ,  Yujiro Sawasaki ,  Keiji Ito ,  Miyahito Hase ,  Hidehiko Makida ,  Makoto Morishima ,  Hiromasa Nishino ,  Yorikata Mizokami

IPC分类号： B66F9/075 ,  B62D33/06 ,  G21F3/00

CPC分类号： B62D33/06 ,  B62D33/0617 ,  B62D33/0621 ,  B66F9/07545 ,  B66F9/0759 ,  G21F3/00 ,  G21F5/14

摘要： A cabin 14 is formed as a casing body with a protection structure. The casing body is partitioned and separable from the vehicle body and has on a bottom side thereof support pillars 42 for secure attachment to the vehicle body 13 with restraint at least in planar coordinate directions.

摘要翻译： 机舱14形成为具有保护结构的壳体。 壳体主体被分隔并与车身分离，并且在其底侧具有支撑柱42，用于至少在平面坐标方向上以约束方式牢固地附接到车体13。

公开(公告)号：US08669584B2

公开(公告)日：2014-03-11

申请号：US13587699

申请日：2012-08-16

申请人： Makoto Sato ,  Satoshi Ota ,  Masakata Koseki

发明人： Makoto Sato ,  Satoshi Ota ,  Masakata Koseki

IPC分类号： H01L33/00

CPC分类号： H01L33/60 ,  H01L2933/0033

摘要： A light emitting device, comprises a LED chip, and a case having an accommodating recession accommodating the LED chip, wherein the light emitting device emits light from an opening portion of the accommodating recession, the case is monolithically formed by injection molding of a resin composition preparing by mixing fine grains of specular reflection material and glass fibers as diffusion reflecting material as fillers therein, an inner surface of a side wall portion of the case works as a reflector that reflects the light emitted from the LED chip so that the light is output from the opening portion, and a thickness of the side wall portion is selected to be smaller than an average length of the glass fibers.

摘要翻译： 一种发光装置，包括LED芯片和具有容纳LED芯片的容纳凹部的壳体，其中，所述发光装置从所述容纳凹部的开口部发射光，所述壳体通过树脂组合物的注射成型 通过将镜面反射材料和玻璃纤维的细晶粒作为扩散反射材料作为填料来制备，壳体的侧壁部分的内表面用作反射从LED芯片发射的光以使得光输出的反射器 从所述开口部开始，所述侧壁部的厚度选择为小于所述玻璃纤维的平均长度。