发明授权
- 专利标题: Phase changeable memory devices including nitrogen and/or silicon
- 专利标题(中): 包括氮和/或硅的相变存储器件
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申请号: US12039156申请日: 2008-02-28
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公开(公告)号: US07462900B2公开(公告)日: 2008-12-09
- 发明人: Horii Hideki , Bong-Jin Kuh , Yong-Ho Ha , Jeong-hee Park , Ji-Hye Yi
- 申请人: Horii Hideki , Bong-Jin Kuh , Yong-Ho Ha , Jeong-hee Park , Ji-Hye Yi
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec, P.A.
- 优先权: KR10-2004-0012358 20040224
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L29/76 ; H01L29/94 ; H01L31/119 ; H01L27/10 ; H01L29/73 ; H01L29/74 ; H01L27/148 ; H01L29/768 ; H01L29/00 ; H01L23/48 ; H01L23/52
摘要:
Phase-changeable memory devices and method of fabricating phase-changeable memory devices are provided that include a phase-changeable material pattern of a phase-changeable material that may include nitrogen atoms and/or silicon atoms. First and second electrodes are electrically connected to the phase-changeable material pattern and provide an electrical signal thereto. The phase-changeable material pattern may have a polycrystal line structure.
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