Invention Grant
US07479463B2 Method for heating a chemically amplified resist layer carried on a rotating substrate
失效
用于加热承载在旋转衬底上的化学放大抗蚀剂层的方法
- Patent Title: Method for heating a chemically amplified resist layer carried on a rotating substrate
- Patent Title (中): 用于加热承载在旋转衬底上的化学放大抗蚀剂层的方法
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Application No.: US11684154Application Date: 2007-03-09
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Publication No.: US07479463B2Publication Date: 2009-01-20
- Inventor: John Kulp , Michael Carcasi , Merritt Funk
- Applicant: John Kulp , Michael Carcasi , Merritt Funk
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans LLP
- Main IPC: H01L21/312
- IPC: H01L21/312

Abstract:
Embodiments of an apparatus and methods for heating a substrate and a sacrificial layer are generally described herein. Other embodiments may be described and claimed.
Public/Granted literature
- US20080220340A1 APPARATUS AND METHOD FOR HEATING A LAYER CARRIED ON A ROTATING SUBSTRATE Public/Granted day:2008-09-11
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