Invention Grant
- Patent Title: Terminal pad structures and methods of fabricating same
- Patent Title (中): 端子焊盘结构及其制造方法
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Application No.: US11953927Application Date: 2007-12-11
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Publication No.: US07494912B2Publication Date: 2009-02-24
- Inventor: Douglas D. Coolbaugh , Daniel C. Edelstein , Ebenezer E. Eshun , Zhong-Xiang He , Robert M. Rassel , Anthony K. Stamper
- Applicant: Douglas D. Coolbaugh , Daniel C. Edelstein , Ebenezer E. Eshun , Zhong-Xiang He , Robert M. Rassel , Anthony K. Stamper
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Steven Capella
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
Terminal pads and methods of fabricating terminal pads. The methods including forming a conductive diffusion barrier under a conductive pad in or overlapped by a passivation layer comprised of multiple dielectric layers including diffusion barrier layers. The methods including forming the terminal pads subtractively or by a damascene process.
Public/Granted literature
- US20080090407A1 TERMINAL PAD STRUCTURES AND METHODS OF FABRICATING SAME Public/Granted day:2008-04-17
Information query
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