发明授权
- 专利标题： Generation method of light intensity distribution, generation apparatus of light intensity distribution, and light modulation element assembly
- 专利标题（中）： 光强分布的产生方法，光强分布的发生装置和光调制元件组装
-
申请号： US11275961申请日： 2006-02-07
-
公开(公告)号： US07499147B2公开(公告)日： 2009-03-03
- 发明人: Yukio Taniguchi , Hiroyuki Ogawa , Masayuki Jyumonji , Noritaka Akita , Masakiyo Matsumura
- 申请人： Yukio Taniguchi , Hiroyuki Ogawa , Masayuki Jyumonji , Noritaka Akita , Masakiyo Matsumura
- 申请人地址： JP Yokohama-shi
- 专利权人： Advanced LCD Technologies Development Center Co., Ltd.
- 当前专利权人： Advanced LCD Technologies Development Center Co., Ltd.
- 当前专利权人地址： JP Yokohama-shi
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP2005-031188 20050208
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03B27/32
摘要：
A generation method of a light intensity distribution uses a first light modulation element and a second light modulation element which are arranged to be apart from each other by a distance D and face each other in parallel to optically modulate a light beam which enters the light modulation elements, thereby generating a light intensity distribution on a target surface. The first light modulation element has a pattern formed by repeating a basic unit having a pitch P. The distance D is set to a distance with which the light intensity distribution generated on the predetermined surface is not changed even if a relative position of the first light modulation element and the second light modulation element is shifted in a plane direction.
公开/授权文献
信息查询
