公开(公告)号：US08259375B2

公开(公告)日：2012-09-04

申请号：US12773577

申请日：2010-05-04

申请人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Noritaka Akita

发明人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Noritaka Akita

IPC分类号： G03H1/00 ,  G02B26/00 ,  G02F1/01 ,  G01J1/32 ,  G01J1/00 ,  H01L21/20

CPC分类号： H01L21/0268 ,  B23K26/073 ,  C30B13/24 ,  G02B27/0927 ,  G02B27/0961 ,  H01L21/02595 ,  H01L21/2026 ,  Y10S117/90 ,  Y10T117/10 ,  Y10T117/1004 ,  Y10T117/1008

摘要： The present invention comprises a light modulation optical system having a first element which forms a desired light intensity gradient distribution to an incident light beam and a second element which forms a desired light intensity minimum distribution with an inverse peak shape to the same, and an image formation optical system which is provided between the light modulation optical system and a substrate having a polycrystal semiconductor film or an amorphous semiconductor film, wherein the incident light beam to which the light intensity gradient distribution and the light intensity minimum distribution are formed is applied to the polycrystal semiconductor film or the amorphous semiconductor film through the image formation optical system, thereby crystallizing a non-crystal semiconductor film. The pattern of the first element is opposed to the pattern of the second element.

摘要翻译： 本发明包括光调制光学系统，其具有形成对入射光束的期望光强度梯度分布的第一元件和形成具有相反峰值形状的期望光强度最小分布的第二元件，以及图像 形成光学系统，其设置在光调制光学系统和具有多晶半导体膜或非晶半导体膜的基板之间，其中形成有光强度梯度分布和光强度最小分布的入射光束被施加到 多晶半导体膜或通过图像形成光学系统的非晶半导体膜，从而使非晶半导体膜结晶。 第一元件的图案与第二元件的图案相反。

公开(公告)号：US08009345B2

公开(公告)日：2011-08-30

申请号：US12962750

申请日：2010-12-08

申请人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Kazufumi Azuma ,  Tomoya Kato ,  Takahiko Endo

发明人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Kazufumi Azuma ,  Tomoya Kato ,  Takahiko Endo

IPC分类号： G02F1/01

CPC分类号： B23K26/066

摘要： A crystallization apparatus includes a light modulation element, and an image forming optical system that forms a light intensity distribution set based on light transmitted through the light modulation element on an irradiation surface. The crystallization apparatus irradiates a non-single crystal semiconductor film with light having the light intensity distribution to generate a crystallized semiconductor film. A curvature radius of at least one isointensity line of a light intensity substantially varies along the isointensity line in the light intensity distribution on the irradiation surface, and a curvature radius of at least a part of the isointensity line has a minimum value of 0.3 μm or below.

摘要翻译： 结晶装置包括光调制元件和形成光学系统，其形成基于在照射表面上透过光调制元件的光的光强度分布。 结晶装置用具有光强度分布的光照射非单晶半导体膜以产生结晶半导体膜。 光强度的至少一个等距线的曲率半径沿着照射面上的光强度分布中的强度线实质上变化，并且至少部分等距线的曲率半径具有0.3μm的最小值或 下面。

公开(公告)号：US07927421B2

公开(公告)日：2011-04-19

申请号：US11687113

申请日：2007-03-16

申请人： Yukio Taniguchi

发明人： Yukio Taniguchi

IPC分类号： C30B1/02

CPC分类号： C30B13/24 ,  Y10T117/10 ,  Y10T117/1008

摘要： A light irradiation apparatus irradiates a target plane with light having a predetermined light intensity distribution. The apparatus includes a light modulation element having a light modulation pattern of a periodic structure represented by a primitive translation vector (a1, a2), an illumination system for illuminating the modulation element with the light, and an image forming optical system for forming the predetermined light intensity distribution obtained by the modulation pattern on the target plane. A shape of an exit pupil of the illumination system is similar to the Wigner-Seitz cell of a primitive reciprocal lattice vector (b1, b2) obtained from the primitive translation vector (a1, a2) by the following equations: b1=2π(a2×a3)/(a1·(a2×a3)) and b2=2π(a3×a1)/(a1·(a2×a3)) in which a3 is a vector having an arbitrary size in a normal direction of a flat surface of the modulation pattern of the modulation element, “·” is an inner product of the vector, and “×” is an outer product of the vector.

摘要翻译： 光照射装置用具有预定光强度分布的光照射目标平面。 该装置包括具有由原始平移向量（a1，a2）表示的周期性结构的光调制图案的光调制元件，用于用光照亮调制元件的照明系统，以及用于形成预定的 通过目标平面上的调制图案获得的光强度分布。 照明系统的出射光瞳的形状类似于通过以下等式从原始平移向量（a1，a2）获得的原始互逆格子向量（b1，b2）的Wigner-Seitz单元：b1 = 2＆pgr a2×a3）/（a1·（a2×a3））和b2 = 2＆pgr（a3×a1）/（a1·（a2×a3）），其中a3是在 调制元件的调制图案的平坦面，“·”是矢量的内积，“×”是矢量的外积。

公开(公告)号：US07813022B2

公开(公告)日：2010-10-12

申请号：US11785314

申请日：2007-04-17

申请人： Yukio Taniguchi

发明人： Yukio Taniguchi

IPC分类号： G02B26/00

CPC分类号： H01L21/02678 ,  B23K26/066 ,  B23K26/073 ,  B23K26/08 ,  H01L21/2026 ,  H01L27/1285 ,  H01L27/1296

摘要： A light irradiation apparatus includes a light modulation element which modulates a phase of an incident light beam to obtain a V-shaped light intensity distribution having a bottom portion of a minimum light intensity, and an image formation optical system which applies the modulated light beam from the light modulation element to an irradiation target surface in such a manner that the V-shaped light intensity distribution is provided on the irradiation target surface. The light modulation element has such a complex amplitude transmittance distribution that a secondary derivative of a phase value of a complex amplitude distribution becomes substantially zero at the bottom portion of the V-shaped light intensity distribution in an image space of the image formation optical system.

摘要翻译： 光照射装置包括光调制元件，其调制入射光束的相位以获得具有最小光强度的底部的V形光强分布;以及图像形成光学系统，其施加来自 光调制元件以照射目标表面上的V形光强度分布的方式照射到照射目标表面。 光调制元件具有这样的复振幅透射率分布，使得复数振幅分布的相位值的二次导数在图像形成光学系统的图像空间中的V形光强度分布的底部处变为基本为零。

公开(公告)号：US20100214641A1

公开(公告)日：2010-08-26

申请号：US12773577

申请日：2010-05-04

申请人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Noritaka Akita

发明人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Noritaka Akita

IPC分类号： G02F1/01

CPC分类号： H01L21/0268 ,  B23K26/073 ,  C30B13/24 ,  G02B27/0927 ,  G02B27/0961 ,  H01L21/02595 ,  H01L21/2026 ,  Y10S117/90 ,  Y10T117/10 ,  Y10T117/1004 ,  Y10T117/1008

摘要： The present invention comprises a light modulation optical system having a first element which forms a desired light intensity gradient distribution to an incident light beam and a second element which forms a desired light intensity minimum distribution with an inverse peak shape to the same, and an image formation optical system which is provided between the light modulation optical system and a substrate having a polycrystal semiconductor film or an amorphous semiconductor film, wherein the incident light beam to which the light intensity gradient distribution and the light intensity minimum distribution are formed is applied to the polycrystal semiconductor film or the amorphous semiconductor film through the image formation optical system, thereby crystallizing a non-crystal semiconductor film. The pattern of the first element is opposed to the pattern of the second element.

摘要翻译： 本发明包括光调制光学系统，其具有形成对入射光束的期望光强度梯度分布的第一元件和形成具有相反峰值形状的期望光强度最小分布的第二元件，以及图像 形成光学系统，其设置在光调制光学系统和具有多晶半导体膜或非晶半导体膜的基板之间，其中形成有光强度梯度分布和光强度最小分布的入射光束被施加到 多晶半导体膜或通过图像形成光学系统的非晶半导体膜，从而使非晶半导体膜结晶。 第一元件的图案与第二元件的图案相反。

公开(公告)号：US07537660B2

公开(公告)日：2009-05-26

申请号：US11442331

申请日：2006-05-30

申请人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Hirotaka Yamaguchi ,  Mikihiko Nishitani ,  Susumu Tsujikawa ,  Yoshinobu Kimura ,  Masayuki Jyumonji

发明人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Hirotaka Yamaguchi ,  Mikihiko Nishitani ,  Susumu Tsujikawa ,  Yoshinobu Kimura ,  Masayuki Jyumonji

IPC分类号： C30B25/04

CPC分类号： G03B21/56 ,  Y10T117/10 ,  Y10T117/1004 ,  Y10T117/1008 ,  Y10T117/1012

摘要： A crystallization method includes wavefront-dividing an incident light beam into a plurality of light beams, condensing the wavefront-divided light beams in a corresponding phase shift portion of a phase shift mask or in the vicinity of the phase shift portion to form a light beam having an light intensity distribution of an inverse peak pattern in which a light intensity is minimum in a point corresponding to the phase shift portion of the phase shift mask, and irradiating a polycrystalline semiconductor film or an amorphous semiconductor film with the light beam having the light intensity distribution to produce a crystallized semiconductor film.

摘要翻译： 结晶方法包括将入射光束波前分割成多个光束，将波前划分的光束聚集在相移掩模的相应相移部分中或在相移部分附近以形成光束 具有在与相移掩模的相移部分相对应的点中光强度最小的逆峰值图案的光强度分布，以及用具有光的光束照射多晶半导体膜或非晶半导体膜 强度分布以产生结晶的半导体膜。

公开(公告)号：US07505204B2

公开(公告)日：2009-03-17

申请号：US11861885

申请日：2007-09-26

申请人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Hirotaka Yamaguchi ,  Mikihiko Nishitani ,  Susumu Tsujikawa ,  Yoshinobu Kimura ,  Masayuki Jyumonji

发明人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Hirotaka Yamaguchi ,  Mikihiko Nishitani ,  Susumu Tsujikawa ,  Yoshinobu Kimura ,  Masayuki Jyumonji

IPC分类号： G02B5/30

CPC分类号： H01L29/78675 ,  B23K26/066 ,  B23K26/073 ,  B23K26/0734 ,  G02B5/02 ,  G02B5/3083 ,  G03F1/28 ,  G03F1/34 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L27/1285 ,  H01L29/66757 ,  Y10T117/10

摘要： A crystallization apparatus includes an illumination system which applies illumination light for crystallization to a non-single-crystal semiconductor film, and a phase shifter which includes first and second regions disposed to form a straight boundary and transmitting the illumination light from the illumination system by a first phase retardation therebetween, and phase-modulates the illumination light to provide a light intensity distribution having an inverse peak pattern that light intensity falls in a zone of the non-single-crystal semiconductor film containing an axis corresponding to the boundary. The phase shifter further includes a small region which extends into at least one of the first and second regions from the boundary and transmits the illumination light by a second phase retardation with respect to the at least one of the first and second regions.

摘要翻译： 结晶装置包括：向非单晶半导体膜施加用于结晶的照明光的照明系统;以及移相器，其包括设置成形成直边界的第一和第二区域，并将来自照明系统的照明光透过 第一相位相位差，并且对照明光进行相位调制，以提供具有光强度落在包含对应于边界的轴的非单晶半导体膜的区域中的反峰值图案的光强度分布。 移相器还包括从边界延伸到第一和第二区域中的至少一个区域的小区域，并相对于第一和第二区域中的至少一个透射照明光第二相位延迟。

公开(公告)号：US20090009751A1

公开(公告)日：2009-01-08

申请号：US12043657

申请日：2008-03-06

申请人： Yukio Taniguchi

发明人： Yukio Taniguchi

IPC分类号： G01J1/00

CPC分类号： G01M11/0264 ,  G01M11/0257

摘要： An aberration measurement apparatus measures the aberration of an imaging optical system. The apparatus includes an illumination system, a separation member, and a measurement unit. The illumination system supplies the imaging optical system with measurement light used to measure an aberration of the imaging optical system and background light different from the measurement light. The separation member separates the measurement light and the background light which have passed through the imaging optical system. The measurement unit measures the aberration of the imaging optical system on the basis of the measurement light separated by the separation member.

摘要翻译： 像差测量装置测量成像光学系统的像差。 该装置包括照明系统，分离构件和测量单元。 照明系统向成像光学系统提供用于测量成像光学系统的像差和与测量光不同的背景光的测量光。 分离构件分离已经通过成像光学系统的测量光和背景光。 测量单元基于由分离构件分离的测量光来测量成像光学系统的像差。

公开(公告)号：US20070151507A1

公开(公告)日：2007-07-05

申请号：US11681030

申请日：2007-03-01

申请人： Yukio TANIGUCHI ,  Masakiyo Matsumura ,  Noritaka Akita

发明人： Yukio TANIGUCHI ,  Masakiyo Matsumura ,  Noritaka Akita

IPC分类号： C30B23/00 ,  C30B25/00

CPC分类号： H01L21/0268 ,  B23K26/073 ,  C30B13/24 ,  G02B27/0927 ,  G02B27/0961 ,  H01L21/02595 ,  H01L21/2026 ,  Y10S117/90 ,  Y10T117/10 ,  Y10T117/1004 ,  Y10T117/1008

摘要： The present invention comprises a light modulation optical system having a first element which forms a desired light intensity gradient distribution to an incident light beam and a second element which forms a desired light intensity minimum distribution with an inverse peak shape to the same, and an image formation optical system which is provided between the light modulation optical system and a substrate having a polycrystal semiconductor film or an amorphous semiconductor film, wherein the incident light beam to which the light intensity gradient distribution and the light intensity minimum distribution are formed is applied to the polycrystal semiconductor film or the amorphous semiconductor film through the image formation optical system, thereby crystallizing a non-crystal semiconductor film. The pattern of the first element is opposed to the pattern of the second element.

摘要翻译： 本发明包括光调制光学系统，其具有形成对入射光束的期望光强度梯度分布的第一元件和形成具有相反峰值形状的期望光强度最小分布的第二元件，以及图像 形成光学系统，其设置在光调制光学系统和具有多晶半导体膜或非晶半导体膜的基板之间，其中形成有光强度梯度分布和光强度最小分布的入射光束被施加到 多晶半导体膜或通过图像形成光学系统的非晶半导体膜，从而使非晶半导体膜结晶。 第一元件的图案与第二元件的图案相反。

公开(公告)号：US20070115521A1

公开(公告)日：2007-05-24

申请号：US11622868

申请日：2007-01-12

申请人： Kenji UEDA ,  Tsuyoshi Hotta ,  Yukio Taniguchi ,  Atsushi Sekiguchi ,  Hideyuki Iriyama

发明人： Kenji UEDA ,  Tsuyoshi Hotta ,  Yukio Taniguchi ,  Atsushi Sekiguchi ,  Hideyuki Iriyama

IPC分类号： G03H1/02

CPC分类号： G03H1/26 ,  G02B5/32 ,  G03H1/0236 ,  G03H1/18 ,  G03H1/24 ,  G03H2001/0439 ,  G03H2001/186 ,  G03H2001/2263 ,  G03H2001/2271 ,  G03H2001/263 ,  G03H2001/266 ,  G03H2001/303 ,  G03H2222/16 ,  G03H2223/18 ,  G03H2230/10 ,  G03H2250/34 ,  G03H2250/44 ,  G03H2260/12 ,  G03H2270/23

摘要： The hologram recording sheet according to the invention is made up of a base film and hologram sensitive materials sensitive to different wavelength regions formed therein in a desired pattern, or a film and at least two hologram recording sensitive materials sensitive to different wavelength regions laminated on the film with a transparent plastic spacer layer located therebetween, thereby enabling the required diffraction light wavelengths to be recorded on the required sites without producing unnecessary interference fringes. At least two hologram recording sensitive materials sensitive to different wavelength regions are formed on different sites on a film in dotted or striped configuration, the size of which is up to 200 mm or at least twice as large as the thickness of the sensitive material layers, thereby enabling regions diffracting light of different wavelengths to be formed in the form of independent sets of interference fringes.