发明授权
US07532309B2 Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid
有权
浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中
- 专利标题： Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid
- 专利标题（中）： 浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中
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申请号： US11523595申请日： 2006-09-20
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公开(公告)号： US07532309B2公开(公告)日： 2009-05-12
- 发明人: Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
- 申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 主分类号： G03B27/54
- IPC分类号： G03B27/54
摘要：
A lithography apparatus includes a fluid confinement plate which can completely submerge the imaging surface of a substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of a projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface.
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