Invention Grant
- Patent Title: Electron beam irradiation method, electron beam irradiation apparatus, and electron beam irradiation apparatus for open-mouthed container
- Patent Title (中): 电子束照射方法，电子束照射装置和开口容器的电子束照射装置
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Application No.: US12065681Application Date: 2006-09-21
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Publication No.: US07767987B2Publication Date: 2010-08-03
- Inventor: Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
- Applicant: Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
- Applicant Address: JP Tokyo
- Assignee: Japan AE Power Systems Corporation
- Current Assignee: Japan AE Power Systems Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young Basile
- Priority: JP2005-302874 20051018; JP2005-302875 20051018; JP2005-302876 20051018; JP2006-124738 20060428
- International Application: PCT/JP2006/318777 WO 20060921
- International Announcement: WO2007/046213 WO 20070426
- Main IPC: G21K1/08
- IPC: G21K1/08 ; H01J3/14 ; H01J3/26 ; H01J49/42
Abstract:
There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.
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