发明授权
US07872240B2 Corrector for charged-particle beam aberration and charged-particle beam apparatus 有权
带电粒子束像差校正器和带电粒子束装置

Corrector for charged-particle beam aberration and charged-particle beam apparatus
摘要:
In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.
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