发明授权
- 专利标题: Corrector for charged-particle beam aberration and charged-particle beam apparatus
- 专利标题(中): 带电粒子束像差校正器和带电粒子束装置
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申请号: US12183622申请日: 2008-07-31
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公开(公告)号: US07872240B2公开(公告)日: 2011-01-18
- 发明人: Hiroyuki Ito , Yuko Sasaki , Yoshiya Higuchi , Takeshi Kawasaki
- 申请人: Hiroyuki Ito , Yuko Sasaki , Yoshiya Higuchi , Takeshi Kawasaki
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2007-198275 20070731
- 主分类号: G21K1/08
- IPC分类号: G21K1/08 ; H01J3/14 ; H01J3/26 ; H01J49/42
摘要:
In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.