发明授权
- 专利标题: Probe arrays and method for making
- 专利标题(中): 探针阵列和制作方法
-
申请号: US11929539申请日: 2007-10-30
-
公开(公告)号: US07878385B2公开(公告)日: 2011-02-01
- 发明人: Ananda H. Kumar , Ezekiel J. J. Kruglick , Adam L. Cohen , Kieun Kim , Gang Zhang , Richard T. Chen , Christopher A. Bang , Vacit Arat , Michael S. Lockard , Uri Frodis , Pavel B. Lembrikov , Jeffrey A. Thompson
- 申请人: Ananda H. Kumar , Ezekiel J. J. Kruglick , Adam L. Cohen , Kieun Kim , Gang Zhang , Richard T. Chen , Christopher A. Bang , Vacit Arat , Michael S. Lockard , Uri Frodis , Pavel B. Lembrikov , Jeffrey A. Thompson
- 申请人地址: US CA Van Nuys
- 专利权人: Microfabrica Inc.
- 当前专利权人: Microfabrica Inc.
- 当前专利权人地址: US CA Van Nuys
- 代理商 Dennis R. Smalley
- 主分类号: B23K31/02
- IPC分类号: B23K31/02
摘要:
Embodiments of invention are directed to the formation of microprobes (i.e. compliant electrical or electronic contact elements) on a temporary substrate, dicing individual probe arrays, and then transferring the arrays to space transformers or other permanent substrates. Some embodiments of the invention transfer probes to permanent substrates prior to separating the probes from a temporary substrate on which the probes were formed while other embodiments do the opposite. Some embodiments, remove sacrificial material prior to transfer while other embodiments remove sacrificial material after transfer. Some embodiments are directed to the bonding of first and second electric components together using one or more solder bumps with enhanced aspect ratios (i.e. height to width ratios) obtained as a result of surrounding the bumps at least in part with rings of a retention material. The retention material may act be a solder mask material.
公开/授权文献
- US20080093424A1 Probe Arrays and Method for Making 公开/授权日:2008-04-24
信息查询
IPC分类: