发明授权
US07911583B2 Exposure apparatus, exposure method, and method for producing device
有权
曝光装置，曝光方法和制造装置的方法
- 专利标题： Exposure apparatus, exposure method, and method for producing device
- 专利标题（中）： 曝光装置，曝光方法和制造装置的方法
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申请号： US11879510申请日： 2007-07-18
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公开(公告)号： US07911583B2公开(公告)日： 2011-03-22
- 发明人: Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
- 申请人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2003-049365 20030226; JP2003-110748 20030415; JP2003-320100 20030911
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/52
摘要：
An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system. The liquid supply mechanism is isolated from the projection optical system in terms of vibration.