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公开(公告)号：US07907253B2
公开(公告)日：2011-03-15
申请号：US11826465
申请日：2007-07-16
申请人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
发明人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system, and a liquid recovery mechanism which recovers the liquid on the substrate simultaneously at a plurality of positions. The liquid recovery mechanism recovers the liquid with a recovery force which differs depending on the position for recovering the liquid.
摘要翻译： 曝光装置通过将预定图案的图像通过液体投影到基板上来曝光基板。 曝光装置包括将图案的图像投影到基板上的投影光学系统，将液体供给到基板上以在基板的一部分上形成液浸区域的液体供给机构，该液浸区域包括投影光学部 系统，以及在多个位置同时回收基板上的液体的液体回收机构。 液体回收机构用回收力来回收液体，该恢复力根据用于回收液体的位置而不同。
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公开(公告)号：US07932991B2
公开(公告)日：2011-04-26
申请号：US11366746
申请日：2006-03-03
申请人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
发明人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate. The liquid supply mechanism supplies the liquid onto the substrate simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.
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公开(公告)号：US07453550B2
公开(公告)日：2008-11-18
申请号：US11826624
申请日：2007-07-17
申请人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
发明人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system, a liquid recovery mechanism which recovers the liquid on the substrate at a liquid recovery position apart from the projection area, and a trap member which is arranged outside the liquid recovery position of the liquid recovery mechanism with respect to the projection area and which is formed with a liquid trap surface for capturing the liquid.
摘要翻译： 曝光装置通过将预定图案的图像通过液体投影到基板上来曝光基板。 曝光装置包括将图案的图像投影到基板上的投影光学系统，将液体供给到基板上以在基板的一部分上形成液浸区域的液体供给机构，该液浸区域包括投影光学部 系统，液体回收机构，其在离开投影区域的液体回收位置处回收基板上的液体;以及捕集部件，其相对于投影区域布置在液体回收机构的液体回收位置的外侧， 形成有用于捕获液体的液体捕获表面。
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公开(公告)号：US08102504B2
公开(公告)日：2012-01-24
申请号：US11502393
申请日：2006-08-11
申请人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
发明人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： A lithographic apparatus includes an illuminator configured to condition a radiation beam; a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, wherein the liquid has a contact angle of (a) less than 60° with the projection system, or the liquid supply system, or both, or (b) less than 80° with a surface of the substrate, or (c) both (a) and (b).
摘要翻译： 光刻设备包括配置成调节辐射束的照明器; 被构造成保持图案形成装置的支撑件，所述图案形成装置被配置为在其横截面中赋予所述辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及液体供应系统，其构造成用液体至少部分地填充所述投影系统和所述基板之间的空间，其中所述液体与所述投影系统或所述液体供应系统具有（a）小于60°的接触角， 或（b）与基材的表面小于80°，或（c）（a）和（b）两者。
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公开(公告)号：US07911583B2
公开(公告)日：2011-03-22
申请号：US11879510
申请日：2007-07-18
申请人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
发明人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system. The liquid supply mechanism is isolated from the projection optical system in terms of vibration.
摘要翻译： 曝光装置通过将预定图案的图像通过液体投影到基板上来曝光基板。 曝光装置包括将图案的图像投影到基板上的投影光学系统和将液体供给到基板上以在基板的一部分上形成液浸区域的液体供给机构，该液浸区域包括投影部的投影区域 光学系统。 液体供给机构在振动方面与投影光学系统隔离。
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公开(公告)号：US07907254B2
公开(公告)日：2011-03-15
申请号：US11826943
申请日：2007-07-19
申请人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
发明人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus successively exposes a plurality of shot areas on a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, and a liquid supply mechanism which supplies the liquid from a supply port arranged opposite to the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system. The liquid supply mechanism continuously supplies the liquid from the supply port during a period in which an exposure process is performed for the plurality of shot areas on the substrate.
摘要翻译： 曝光装置通过将预定图案的图像通过液体投射到基板上而连续地暴露在基板上的多个照射区域。 曝光装置包括将图案的图像投影到基板上的投影光学系统和从与基板相对设置的供给口供给液体的液体供给机构，在基板的一部分上形成液浸区域， 投影光学系统的投影区域。 液体供给机构在对基板上的多个照射区域进行曝光处理的期间，连续地供给来自供给口的液体。
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公开(公告)号：US07542128B2
公开(公告)日：2009-06-02
申请号：US11879514
申请日：2007-07-18
申请人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
发明人： Hiroyuki Nagasaka , Soichi Owa , Yasugumi Nishii
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which has a supply flow passage through which the liquid is supplied onto the substrate, and a liquid recovery mechanism which has a recovery flow passage through which the supplied liquid is recovered. At least one of the supply flow passage and the recovery flow passage is formed in a stacked member in which a plurality of plate members are stacked.
摘要翻译： 曝光装置通过将预定图案的图像通过液体投影到基板上来曝光基板。 曝光装置包括将图案的图像投影到基板上的投影光学系统，具有将液体供给到基板上的供给流路的液体供给机构，以及具有回收流路 回收供应的液体。 供给流路和回收流路中的至少一个形成在多个板构件堆叠的层叠构件中。
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