发明授权
- 专利标题： Particle trap for a plasma source
- 专利标题（中）： 用于等离子体源的粒子阱
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申请号： US12147078申请日： 2008-06-26
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公开(公告)号： US07914603B2公开(公告)日： 2011-03-29
- 发明人: Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
- 申请人： Ali Shajii , Xing Chen , Andrew Cowe , David Burtner , William Robert Entley , ShouQian Shao
- 申请人地址： US MA Andover
- 专利权人： MKS Instruments, Inc.
- 当前专利权人： MKS Instruments, Inc.
- 当前专利权人地址： US MA Andover
- 代理机构： Proskauer Rose LLP
- 主分类号： B01D46/46
- IPC分类号： B01D46/46
摘要：
A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.
公开/授权文献
- US20090320677A1 PARTICLE TRAP FOR A PLASMA SOURCE 公开/授权日：2009-12-31
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