发明授权
- 专利标题: Method for manufacturing cell culture substrate
- 专利标题(中): 细胞培养基质的制造方法
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申请号: US11062674申请日: 2005-02-22
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公开(公告)号: US07919305B2公开(公告)日: 2011-04-05
- 发明人: Hideyuki Miyake , Hideshi Hattori , Yoichi Takahashi
- 申请人: Hideyuki Miyake , Hideshi Hattori , Yoichi Takahashi
- 申请人地址: JP Tokyo-to
- 专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人地址: JP Tokyo-to
- 代理机构: Ladas & Parry LLP
- 优先权: JP2004-042443 20040219
- 主分类号: C12M1/34
- IPC分类号: C12M1/34 ; C12M1/36 ; C12M1/38 ; C12M3/00 ; C12M1/00 ; C12N5/00 ; C12N5/02
摘要:
A main object of the invention is to provide a new method for producing a cell culture substrate used to cause cells to adhere in a highly precise form onto a base material and then culture the cells.To attain the object, the invention provides a method for producing a cell culture substrate comprising: a patterning substrate forming process of forming, on a base material, a cell culture patterning layer wherein a cell adhesion portion having cell adhesive properties and a cell adhesion-inhibiting portion having cell adhesion-inhibiting properties can be formed by action of a photocatalyst by energy irradiation, thereby forming a patterning substrate; an energy irradiating process of irradiating the energy onto the cell culture patterning layer, thereby forming the cell adhesion portion and the cell adhesion-inhibiting portion in a pattern form by action of the photocatalyst; and a cell-containing liquid applying process of applying a cell-containing liquid onto the cell adhesion portion by a region-selecting applying method of applying the cell-containing liquid selectively onto the patterned cell adhesion portion.
公开/授权文献
- US20050279730A1 Method for manufacturing cell culture substrate 公开/授权日:2005-12-22
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