Invention Grant
- Patent Title: Method and apparatus for gas flow measurement
- Patent Title (中): 气流测量方法和装置
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Application No.: US12823935Application Date: 2010-06-25
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Publication No.: US07975558B2Publication Date: 2011-07-12
- Inventor: Jared Ahmad Lee , Ezra Robert Gold , Chunlei Zhang , James Patrick Cruse , Richard Charles Fovell
- Applicant: Jared Ahmad Lee , Ezra Robert Gold , Chunlei Zhang , James Patrick Cruse , Richard Charles Fovell
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, L.L.P.
- Main IPC: G01F1/56
- IPC: G01F1/56 ; C25D7/12 ; C23C16/00 ; F16K11/24
Abstract:
A method and apparatus for measuring gas flow are provided. In one embodiment, a calibration circuit for gas control may be utilized to verify and/or calibrate gas flows utilized for backside cooling, process gas delivery, purge gas delivery, cleaning agent delivery, carrier gases delivery and remediation gas delivery, among others.
Public/Granted literature
- US20100251828A1 METHOD AND APPARATUS FOR GAS FLOW MEASUREMENT Public/Granted day:2010-10-07
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