发明授权
- 专利标题: Methods of forming a non-volatile resistive oxide memory array
- 专利标题(中): 形成非易失性电阻氧化物存储器阵列的方法
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申请号: US12141559申请日: 2008-06-18
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公开(公告)号: US08114468B2公开(公告)日: 2012-02-14
- 发明人: Gurtej Sandhu , John Smythe , Bhaskar Srinivasan
- 申请人: Gurtej Sandhu , John Smythe , Bhaskar Srinivasan
- 申请人地址: US ID Boise
- 专利权人: Boise Technology, Inc.
- 当前专利权人: Boise Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Wells St. John P.S.
- 主分类号: B05D5/12
- IPC分类号: B05D5/12 ; B28B19/00 ; B29B15/00 ; C23C18/00 ; C23C20/00 ; C23C24/00 ; C23C26/00 ; C23C28/00 ; C23C30/00 ; H01C17/06 ; H05K3/00 ; H01L47/00 ; H01L29/08 ; H01L35/24 ; H01L51/00 ; H01L29/02 ; H01L21/00 ; H01L21/16 ; H01L21/20 ; H01L21/36 ; G11C11/00
摘要:
A method of forming a non-volatile resistive oxide memory array includes forming a plurality of one of conductive word lines or conductive bit lines over a substrate. Metal oxide-comprising material is formed over the plurality of said one of the word lines or bit lines. A series of elongated trenches is provided over the plurality of said one of the word lines or bit lines. A plurality of self-assembled block copolymer lines is formed within individual of the trenches in registered alignment with and between the trench sidewalls. A plurality of the other of conductive word lines or conductive bit lines is provided from said plurality of self-assembled block copolymer lines to form individually programmable junctions comprising said metal oxide-comprising material where the word lines and bit lines cross one another.
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