发明授权
US08197659B2 Plating apparatus, plating method and multilayer printed circuit board
有权
电镀装置,电镀方法和多层印刷电路板
- 专利标题: Plating apparatus, plating method and multilayer printed circuit board
- 专利标题(中): 电镀装置,电镀方法和多层印刷电路板
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申请号: US13240626申请日: 2011-09-22
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公开(公告)号: US08197659B2公开(公告)日: 2012-06-12
- 发明人: Toru Nakai , Satoru Kawai , Hiroshi Niwa , Yoshiyuki Iwata
- 申请人: Toru Nakai , Satoru Kawai , Hiroshi Niwa , Yoshiyuki Iwata
- 申请人地址: JP Ogaki-shi
- 专利权人: IBIDEN Co., Ltd.
- 当前专利权人: IBIDEN Co., Ltd.
- 当前专利权人地址: JP Ogaki-shi
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2004-277316 20040924; JP2004-277317 20040924
- 主分类号: C25D5/06
- IPC分类号: C25D5/06 ; C25D5/08 ; C25D5/22 ; H05K3/02 ; H05K3/06 ; H05K3/42
摘要:
A method for manufacturing a multilayer printed circuit board including providing a core substrate having a penetrating-hole, forming an electroless plated film on a surface of the substrate and an inner wall surface of the penetrating-hole, electrolytically plating the substrate while moving with respect to the surface of the substrate an insulating member in contact with the surface of the substrate such that an electrolytic plated film is formed on the electroless plated film, an opening space inside the penetrating-hole is filled with an electrolytic material, and a through-hole conductor structure is formed in the penetrating-hole, forming an etching resist having an opening pattern on the electrolytic plated film, and removing an exposed pattern of the electrolytic plated film exposed by the opening pattern and a pattern of the electroless plated film under the exposed pattern such that a conductor circuit is formed on the surface of the substrate.
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