Invention Grant
US08198133B2 Structures and methods to improve lead-free C4 interconnect reliability
有权
提高无铅C4互连可靠性的结构和方法
- Patent Title: Structures and methods to improve lead-free C4 interconnect reliability
- Patent Title (中): 提高无铅C4互连可靠性的结构和方法
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Application No.: US12458441Application Date: 2009-07-13
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Publication No.: US08198133B2Publication Date: 2012-06-12
- Inventor: Timothy H. Daubenspeck , Paul Fortier , Jeffrey P. Gambino , Christopher D. Muzzy , David L. Questad , Wolfgang Sauter , Timothy D. Sullivan
- Applicant: Timothy H. Daubenspeck , Paul Fortier , Jeffrey P. Gambino , Christopher D. Muzzy , David L. Questad , Wolfgang Sauter , Timothy D. Sullivan
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Roberts Mlotkowski Safran & Cole, P.C.
- Agent Richard Kotulak
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Controlled collapse chip connection (C4) structures and methods of manufacture, and more specifically to structures and methods to improve lead-free C4 interconnect reliability. A structure includes a ball limited metallization (BLM) layer and a controlled collapse chip connection (C4) solder ball formed on the BLM layer. Additionally, the structure includes a final metal pad layer beneath the BLM layer and a cap layer beneath the final metal pad layer. Furthermore, the structure includes an air gap formed beneath the C4 solder ball between the final metal pad layer and one of the BLM layer and the cap layer.
Public/Granted literature
- US20110006422A1 Structures and methods to improve lead-free C4 interconnect reliability Public/Granted day:2011-01-13
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