发明授权
US08198133B2 Structures and methods to improve lead-free C4 interconnect reliability 有权
提高无铅C4互连可靠性的结构和方法

Structures and methods to improve lead-free C4 interconnect reliability
摘要:
Controlled collapse chip connection (C4) structures and methods of manufacture, and more specifically to structures and methods to improve lead-free C4 interconnect reliability. A structure includes a ball limited metallization (BLM) layer and a controlled collapse chip connection (C4) solder ball formed on the BLM layer. Additionally, the structure includes a final metal pad layer beneath the BLM layer and a cap layer beneath the final metal pad layer. Furthermore, the structure includes an air gap formed beneath the C4 solder ball between the final metal pad layer and one of the BLM layer and the cap layer.
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