Invention Grant
- Patent Title: Clustered stacked vias for reliable electronic substrates
- Patent Title (中): 集成的通孔用于可靠的电子基板
-
Application No.: US12020565Application Date: 2008-01-27
-
Publication No.: US08242593B2Publication Date: 2012-08-14
- Inventor: Karan Kacker , Douglas O. Powell , David L. Questad , David J. Russell , Sri M. Sri-Jayantha
- Applicant: Karan Kacker , Douglas O. Powell , David L. Questad , David J. Russell , Sri M. Sri-Jayantha
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Michael J. Buchenhorner; Vazken Alexanian
- Main IPC: H01L23/04
- IPC: H01L23/04 ; H01L23/48 ; H01L23/52 ; H01L29/40

Abstract:
A substrate via structure for stacked vias in a substrate/chip assembly includes: a center via stack and a plurality of stacked vias clustered around the center via stack. In this structure, the center via and the surrounding vias are made of copper. Some of the surrounding vias may be non-functional vias and these may be of a different height than the functional vias.
Public/Granted literature
- US20090189290A1 CLUSTERED STACKED VIAS FOR RELIABLE ELECTRONIC SUBSTRATES Public/Granted day:2009-07-30
Information query
IPC分类: