发明授权
- 专利标题: Clustered stacked vias for reliable electronic substrates
- 专利标题(中): 集成的通孔用于可靠的电子基板
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申请号: US12020565申请日: 2008-01-27
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公开(公告)号: US08242593B2公开(公告)日: 2012-08-14
- 发明人: Karan Kacker , Douglas O. Powell , David L. Questad , David J. Russell , Sri M. Sri-Jayantha
- 申请人: Karan Kacker , Douglas O. Powell , David L. Questad , David J. Russell , Sri M. Sri-Jayantha
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 Michael J. Buchenhorner; Vazken Alexanian
- 主分类号: H01L23/04
- IPC分类号: H01L23/04 ; H01L23/48 ; H01L23/52 ; H01L29/40
摘要:
A substrate via structure for stacked vias in a substrate/chip assembly includes: a center via stack and a plurality of stacked vias clustered around the center via stack. In this structure, the center via and the surrounding vias are made of copper. Some of the surrounding vias may be non-functional vias and these may be of a different height than the functional vias.
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