Invention Grant
US08274063B2 Composite focused ion beam device, process observation method using the same, and processing method
有权
复合聚焦离子束装置，工艺观察方法采用相同的加工方法
- Patent Title: Composite focused ion beam device, process observation method using the same, and processing method
- Patent Title (中): 复合聚焦离子束装置，工艺观察方法采用相同的加工方法
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Application No.: US12733091Application Date: 2008-08-06
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Publication No.: US08274063B2Publication Date: 2012-09-25
- Inventor: Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
- Applicant: Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
- Applicant Address: JP
- Assignee: SII NanoTechnology Inc.
- Current Assignee: SII NanoTechnology Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2007-207098 20070808
- International Application: PCT/JP2008/064123 WO 20080806
- International Announcement: WO2009/020151 WO 20090212
- Main IPC: H01J49/00
- IPC: H01J49/00
Abstract:
A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.
Public/Granted literature
- US20100288924A1 COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING THE SAME,AND PROCESSING METHOD Public/Granted day:2010-11-18
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