摘要:
A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.
摘要:
A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metallic ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion. A beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is smaller than that of the first ion beam 10A emitted from the first ion beam irradiation system 1
摘要:
An apparatus for treating a sample comprises an ion source for irradiating a designated area of the sample with a focused ion beam, a vessel for storing compound to be vaporized, a heater surrounding the vessel for heating the compound to vaporize the same inside the vessel to produce compound vapor, and a nozzle for directing the compound vapor in the form of a vapor stream onto the designated area of the sample being irradiated with the focused ion beam. A valve is disposed along the fluid communication path between the vessel and the nozzle and has a closed state for blocking the flow of compound vapor through the nozzle and an open state for permitting the flow of compound vapor through the nozzle. The apparatus can be used to form pattern films on substrates, to repair defects in photo-masks and X-ray masks, and to cut or connect wiring in integrated circuits.
摘要:
A focused ion beam is irradiated on a predetermined area of a substrate on which a film is to be formed, and a vapor stream of film-forming depositable material is directed onto a localized area of the substrate which is being irradiated with the focused ion beam to convert the film-forming material to a film deposit on the predetermined area of the substrate. The process can be used to repair white-spot defects in masks and to otherwise deposit films having sharply defined edges and widths in the submicron range.
摘要:
A process for forming a pattern film comprises irradating a predetermined area of a substrate with an ion beam while simultaneously having present a polymerizable or carbonizable organic compound to thereby polymerize or carbonize the compound upon the area, the compound having a vapor pressure at room temperature of 1.times.10.sup.-4 to 5.times.10.sup.-3 Torr. The process is particularly suited for correcting so-called white-spot defects in the manufacture of photomasks.
摘要:
A sample introducing apparatus for an inductively coupled plasma mass spectrometric and spectrochemical analyzer is provided to have a branch pipe at a sample pipe of a plasma torch for introducing an oxygen gas controllable in flow rate. The sample, after mixed with a sufficient amount of oxygen, is burnt by a plasma to oxidize and vaporize carbon.
摘要:
In order to provide an ion beam lens to which a film causing a charge and rendering the analysis unstable will not adhere, the ion lens is provided with a deflector for deflecting an ion beam 90.degree.. The side of the deflector opposite the sampling interface is provided with an opening. Also, a correction electrode having at least a pair of elements is interposed between the deflector and a mass filter. Not only may a minute amount of impurities in a sample be detected, but also measurements may be conducted on a consistently stable basis.
摘要:
An inductively coupled mass spectrometer for detecting impurities present in infinitesimal concentrations in a sample. The basic spectrometer structure includes: a nebulizer connected to receive a solution of the sample and a gas for causing the nebulizer to produce a spray in the form of a mist composed of droplets of the sample solution; a spray chamber disposed for receiving the spray and classifying the droplets in the spray; a plasma torch operative for conducting a stream composed of the sample solution and at least one gas; a high frequency power source and a work coil coupled to the plasma torch for supplying energy to generate and maintain a plasma which ionizes the sample solution in the stream; and a mass detector disposed for receiving the ionized sample solution from the plasma torch and operative for detecting impurities in the ionized sample solution. The spray chamber further receives an additional flow of argon gas which acts to suppress the generation of molecular ions in the plasma, so that the analytical performance for detecting impurities, such as Fe or K or the like, is improved.
摘要:
A focused ion beam apparatus includes a plasma generator having a plasma torch therein, which lets plasma flow out while being kept inside, a differential exhaust chamber that is connected to the plasma torch via the torch orifice to cause adiabatic expansion of the plasma flowing out of the plasma torch to form a supersonic flow of the plasma, a drawing orifice provided at the differential exhaust chamber at a position facing the torch orifice to draw ions from the supersonic flow of the plasma, a drawing electrode that electrostatically accelerates ions having passed through the drawing orifice to further draw ions, and an ion optical system that focuses the ions drawn from the drawing electrode and causing the ions to enter the sample by optically manipulating the ions.
摘要:
An apparatus for carrying out inductively coupled plasma mass spectrometry to effect identification and quantification of a trace element contained in a sample solution. A plasma torch is provided for converting the sample solution into a plasma. A sampling interface has a sampling orifice and a skimmer orifice for drawing therethrough the plasma to form an ion beam. A mass filter is provided for effecting mass-separation of the ion beam to filter ions. A detector detects ions which pass through the mass filter. An optical system is composed of a lens, a deflector and a junction member for efficiently introducing the ion beam from the sampling interface into the mass filter. An ammeter is connected to the junction member between the optical system and the mass filter. A monitoring device is provided for monitoring the state of the ion beam within the optical system according to the output of the ammeter and an adjusting device is provided for adjusting the optical system while monitoring the output of the ammeter and an output of the detector.