公开(公告)号：US07323685B2

公开(公告)日：2008-01-29

申请号：US10543843

申请日：2004-02-16

申请人： Kazuo Aita ,  Osamu Takaoka ,  Tomokazu Kozakai

发明人： Kazuo Aita ,  Osamu Takaoka ,  Tomokazu Kozakai

IPC分类号： H01J37/304

CPC分类号： H01J37/265 ,  H01J37/28 ,  H01J2237/244 ,  H01J2237/24475 ,  H01J2237/2487 ,  H01J2237/2826 ,  H01J2237/31744 ,  H01J2237/31749

摘要： When scanning by an ion beam in advance an area 24 including a reference hole 23 formed at a position other than the area to be processed 25 of a light-shielding film 21 on a glass substrate 22, a secondary ion signal of the same atom as the incident ions injected into the substrate is detected instead of detecting the secondary ion signal of the atoms included in the base film, and the position 23 of the hole is stored. Then, the area 24 including the hole formed during the processing is scanned and the secondary ion signal of the same atom as the incident ions is detected to determine the current position 26 of the hole, the position of the hole obtained by the previous detection and the current position of the hole are compared, and the amount of shift of the position of the hole is determined. This shifted amount is regarded as the drift amount.

摘要翻译： 当预先通过离子束扫描包括形成在玻璃基板22上的遮光膜21的除被处理区域25以外的位置的基准孔23的区域24时，具有相同原子的二次离子信号 检测注入到基板中的入射离子，而不是检测基膜中包含的原子的二次离子信号，并且存储孔的位置23。 然后，扫描包括在处理过程中形成的孔的区域24，并且检测与入射离子相同的原子的二次离子信号，以确定孔的当前位置26，通过先前检测获得的孔的位置，以及 比较孔的当前位置，并确定孔的位置的移动量。 该偏移量被认为是漂移量。

公开(公告)号：US06642512B2

公开(公告)日：2003-11-04

申请号：US10055292

申请日：2002-01-23

申请人： Kazuo Aita

发明人： Kazuo Aita

IPC分类号： H01S100

CPC分类号： G01N27/419 ,  H01J2237/3174

摘要： The present invention achieves the quick and precise neutralization operation for wide area charge up and limited area charge up, both existing in a sample in a mixed manner at the same time, by having charge neutralizers separately provided for wide area charge up and limited area charge up respectively, or by having a charge neutralizer with a scanning function, so that a beam can be scanned or stopped at the perceived area by a deflector, or having a charge neutralizer with an iris having a central opening and openings in the periphery of the central opening within the optical system, so that a quick and precise neutralization operation can be achieved with respect to wide area charge up and limited area charge up both existing in a sample in a mixed manner at the same time.

公开(公告)号：US06365905B1

公开(公告)日：2002-04-02

申请号：US09324264

申请日：1999-06-02

申请人： Yoshihiro Koyama ,  Kazuo Aita

发明人： Yoshihiro Koyama ,  Kazuo Aita

IPC分类号： H01J37317

CPC分类号： H01J37/3056 ,  H01J2237/31744

摘要： In a charged particle beam apparatus comprising an ion optical system 3 for focusing ions, a secondary charged particle detector 7 for detecting secondary charged particles produced by beam irradiation of scanning a focused ion beam 2 focused by the ion optical system 3 to a predetermined region of a sample 5, a display unit 9 for displaying an image of the sample surface 5 based on a signal of the secondary charged particle detector, and a gas injector 4 for blowing a gas to the sample surface 5, a focused ion beam processing apparatus is characterized by conducting processing by cooling a gas trap provided between a reservoir 13 or cylinder 18 and a valve 12 to control an assist gas having a high vapor pressure and blowing it through the gas injector 4 simultaneously with irradiating a focused ion beam.

摘要翻译： 在包括用于聚焦离子的离子光学系统3的带电粒子束装置中，用于检测由离子光学系统3聚焦的聚焦离子束2扫描产生的二次带电粒子的二次带电粒子检测器7到 样品5，基于二次带电粒子检测器的信号显示样品表面5的图像的显示单元9和用于向样品表面5吹送气体的气体注入器4，聚焦离子束处理设备 特征在于通过冷却设置在储存器13或气缸18与阀12之间的气体捕集器进行处理，以控制具有高蒸汽压力的辅助气体并且通过气体喷射器4同时照射聚焦的离子束来进行处理。

公开(公告)号：US5854488A

公开(公告)日：1998-12-29

申请号：US879342

申请日：1997-06-20

申请人： Kazuo Aita

发明人： Kazuo Aita

IPC分类号： G01Q30/14 ,  G01Q30/16 ,  G01Q60/00 ,  H01J37/305 ,  H01J37/317 ,  H01L21/205 ,  H01L21/302

CPC分类号： H01J37/3056 ,  H01J2237/31744

摘要： To carry out machining by a focused ion beam using an assist gas including steam gas. In a machining operation by a focused ion beam by using an assist gas including steam gas, as a method of supplying steam gas, the steam gas is supplied from salt hydrate and the pressure of steam is controlled by controlling the temperature of the salt hydrate. As a method for supplying steam gas, when the steam gas is introduced into a vacuum chamber, the flow rate needs to be controlled by a control valve since the vapor pressure of water is very high, which amounts to a complicated gas supply system and which amounts to an expensive device. However, steam vapor having a low pressure is supplied by using salt hydrate, the introduction of gas to a vacuum chamber is made feasible only by passing the gas through a friction pipe and the amount of introducing a gas can be controlled by a simple system where only the temperature of the salt hydrate is controlled by an inexpensive temperature controller.

摘要翻译： 通过使用包括蒸汽气体的辅助气体通过聚焦离子束进行加工。 在通过使用包括蒸汽气体的辅助气体的聚焦离子束的加工操作中，作为供给蒸汽气体的方法，从盐水合物供给蒸气，通过控制盐水合物的温度来控制蒸汽的压力。 作为供给蒸汽气体的方法，当将蒸汽气体引入真空室时，流量需要由控制阀控制，因为水的蒸气压非常高，这相当于复杂的气体供应系统，并且其中 相当于昂贵的设备。 然而，通过使用盐水合物来供给具有低压的蒸汽，通过使气体通过摩擦管使气体向真空室的引入变得可行，并且可以通过简单的系统来控制导入气体的量 只有盐水合物的温度由廉价的温度控制器控制。

公开(公告)号：US08274063B2

公开(公告)日：2012-09-25

申请号：US12733091

申请日：2008-08-06

申请人： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J49/00

CPC分类号： H01J37/08 ,  G01N1/04 ,  G01N1/06 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/0817 ,  H01J2237/31745

摘要： A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.

摘要翻译： 复合聚焦离子束装置具有照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束用于处理或观察样品的第二离子束照射系统。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的等离子体型气体离子源，每个第一离子具有第一质量。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 每个第二离子具有比第一质量小的第二质量。

公开(公告)号：US20100176296A1

公开(公告)日：2010-07-15

申请号：US12733089

申请日：2008-08-06

申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J37/30 ,  H01J27/02 ,  H01J37/08 ,  H01J37/26

CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metal ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion, and a beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is less than that of the first ion beam 10A emitted from the first ion beam irradiation system 10.

摘要翻译： 复合聚焦离子束装置包括：第一离子束照射系统10，其包括用于产生第一离子的液态金属离子源;以及第二离子束照射系统20，其包括用于产生第二离子的气体场离子源， 从第二离子束照射系统20发射的第二离子束20A的距离小于从第一离子束照射系统10发射的第一离子束10A的离子束。

公开(公告)号：US08269194B2

公开(公告)日：2012-09-18

申请号：US12733089

申请日：2008-08-06

申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J49/00

CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

摘要翻译： 复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统 样品。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。 第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

公开(公告)号：US07103209B1

公开(公告)日：2006-09-05

申请号：US10130881

申请日：2000-11-20

申请人： Kazuo Aita

发明人： Kazuo Aita

IPC分类号： G06K9/00

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G06T5/20

摘要： Noted portions of an image, such as a pin point hole in an isolated area or a pattern contour that forms a continuous boundary area, are clearly displayed by first erasing background noise by acquiring information regarding differences between an image detection signal (pixel) of each scanned position (dot) in matrix form and image detection signals of the surrounding scanned positions, and secondly, by adopting a value that is either a largest or smallest value greater than or equal to zero among a plurality of sets of information on value differences as new image information for the scanned position.

摘要翻译： 通过首先通过获取关于每个图像的图像检测信号（像素）之间的差异的信息来消除背景噪声来清楚地显示诸如形成连续边界区域的孤立区域中的针点孔或图形轮廓的图像的部分， 矩阵形式的扫描位置（点）和周围扫描位置的图像检测信号，其次，通过在多个关于值差异的信息集合中采用大于或等于零的最大值或最小值的值作为 扫描位置的新图像信息。

公开(公告)号：US06864475B1

公开(公告)日：2005-03-08

申请号：US09562460

申请日：2000-05-02

申请人： Kazuo Aita ,  Takashi Terada

发明人： Kazuo Aita ,  Takashi Terada

IPC分类号： H04N1/028 ,  H01L21/316 ,  H01L27/00 ,  H01L27/146 ,  H01L27/148 ,  H04N1/04

CPC分类号： H01L27/14601 ,  H01L27/14806

摘要： There are provided a plurality of light sources for applying light beams of red, green, and blue to a document surface. An optical system condenses light that is reflected from the document surface. A plurality of sensors are provided in the image formation section of the optical system, and read an image of the document. A reading device scans the sensors at a predetermined cycle in synchronism of lighting of the light sources. The wavelengths of the light sources are preferably 480 nm, 545 nm, and 640 nm or their vicinities. Information of the image is read out as serial electrical signals corresponding to the respective wavelengths.

摘要翻译： 设置有用于将红色，绿色和蓝色光束施加到文件表面的多个光源。 光学系统凝结从文件表面反射的光。 在光学系统的图像形成部中设置有多个传感器，并读取文件的图像。 读取装置以光源的照明同步地以预定的周期扫描传感器。 光源的波长优选为480nm，545nm，640nm或其附近。 作为对应于各个波长的串行电信号读出图像的信息。

公开(公告)号：US06544692B1

公开(公告)日：2003-04-08

申请号：US09700638

申请日：2001-02-26

申请人： Osamu Takaoka ,  Kazuo Aita

发明人： Osamu Takaoka ,  Kazuo Aita

IPC分类号： G03F900

CPC分类号： G03F1/78 ,  G03F1/74 ,  Y10S430/143

摘要： In the present invention, a dot matrix taking a spot of an ion beam at a processing surface as one dot is set at the processing surface, the presence or absence of secondary charged particles, indicating the presence of a black defect, discharged from a plurality of dots including a noted dot and associated peripheral dots is detected while eliminating black defects by irradiating each dot of a processing region with an ion beam for a fixed time, calculating a physical quantity corresponding to this presence based on this detection information, and determining completion of processing of this noted dot when this value is less than or equal to a reference value.

摘要翻译： 在本发明中，将处理用面上的离子束的点作为一个点的点阵设定在处理用面上，存在或不存在表示从多个排出的黑色缺陷的二次带电粒子 通过用固定时间用离子束照射处理区域的每个点来消除黑色缺陷，并且基于该检测信息计算与该存在相对应的物理量，并且确定完成 当该值小于或等于参考值时处理该注意点。