发明授权
- 专利标题: Fabrication method of semiconductor package structure
- 专利标题(中): 半导体封装结构的制造方法
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申请号: US12770059申请日: 2010-04-29
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公开(公告)号: US08304268B2公开(公告)日: 2012-11-06
- 发明人: Pang-Chun Lin , Chun-Yuan Li , Chien-Ping Huang , Chun-Chi Ke
- 申请人: Pang-Chun Lin , Chun-Yuan Li , Chien-Ping Huang , Chun-Chi Ke
- 申请人地址: TW Taichung
- 专利权人: Siliconware Precision Industries Co., Ltd.
- 当前专利权人: Siliconware Precision Industries Co., Ltd.
- 当前专利权人地址: TW Taichung
- 代理机构: Edwards Wildman Palmer LLP
- 代理商 Peter F. Corless; Steven M. Jensen
- 优先权: TW98146227A 20091231
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
A fabrication method of a semiconductor package structure includes: patterning a metal plate having first and second surfaces; forming a dielectric layer on the metal plate; forming a metal layer on the first surface and the dielectric layer; forming metal pads on the second surface, the metal layer having a die pad and traces each having a bond pad; mounting a semiconductor chip on the die pad, followed by connecting electrically the semiconductor chip to the bond pads through bonding wires; forming an encapsulant to cover the semiconductor chip and the metal layer; removing portions of the metal plate not covered by the metal pads so as to form metal pillars; and performing a singulation process. The fabrication method is characterized by disposing traces with bond pads close to the die pad to shorten the bonding wires and forming metal pillars protruding from the dielectric layer to avoid solder bridging.
公开/授权文献
- US20110159643A1 FABRICATION METHOD OF SEMICONDUCTOR PACKAGE STRUCTURE 公开/授权日:2011-06-30