发明授权
- 专利标题： Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method
- 专利标题（中）： 包括磁体的光刻设备，用于保护光刻设备中的磁体的方法和器件制造方法
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申请号： US12735823申请日： 2009-02-19
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公开(公告)号： US08446560B2公开(公告)日： 2013-05-21
- 发明人: Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelo Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
- 申请人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelo Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/NL2009/050074 WO 20090219
- 国际公布： WO2009/104962 WO 20090827
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.
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