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1.发明授权Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method 有权包括磁体的光刻设备，用于保护光刻设备中的磁体的方法和器件制造方法公开(公告)号：US08446560B2
公开(公告)日：2013-05-21
申请号：US12735823
申请日：2009-02-19
申请人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelo Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
发明人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelo Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
CPC分类号： G03F7/70933 , G03F7/70808 , G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.
摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。 外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。 可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。
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2.发明申请公开(公告)号：US20110013157A1
公开(公告)日：2011-01-20
申请号：US12735823
申请日：2009-02-19
申请人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
发明人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
CPC分类号： G03F7/70933 , G03F7/70808 , G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.
摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。 外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。 可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。
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公开(公告)号：US09164403B2
公开(公告)日：2015-10-20
申请号：US13512128
申请日：2010-12-08
申请人： Antonius Theodorus Wilhelmus Kempen , Richard Joseph Bruls , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Wilbert Jan Mestrom
发明人： Antonius Theodorus Wilhelmus Kempen , Richard Joseph Bruls , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Wilbert Jan Mestrom
CPC分类号： G03F7/70908 , B08B3/08 , G03F7/70033 , G03F7/708 , G03F7/70916 , G03F7/70925
摘要： A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.
摘要翻译： 辐射源为光刻设备产生极紫外辐射，作为设置有低压氢环境的室。 向腔室提供痕量的保护性化合物，例如H 2 O，H 2 O 2，O 2，NH 3或NO x，以有助于在室中的金属（例如钛）组分上维持保护性氧化膜。
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4.发明申请公开(公告)号：US20120295205A1
公开(公告)日：2012-11-22
申请号：US13512128
申请日：2010-12-08
申请人： Antonius Theodorus Wilhelmus Kempen , Richard Joseph Bruls , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Wilbert Jan Mestrom
发明人： Antonius Theodorus Wilhelmus Kempen , Richard Joseph Bruls , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Gerardus Hubertus Petrus Maria Swinkels , Wilbert Jan Mestrom
CPC分类号： G03F7/70908 , B08B3/08 , G03F7/70033 , G03F7/708 , G03F7/70916 , G03F7/70925
摘要： A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.
摘要翻译： 辐射源为光刻设备产生极紫外辐射，作为设置有低压氢环境的室。 向腔室提供痕量的保护性化合物，例如H 2 O，H 2 O 2，O 2，NH 3或NO x，以有助于在室中的金属（例如钛）组分上维持保护性氧化膜。
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公开(公告)号：US20110143288A1
公开(公告)日：2011-06-16
申请号：US13058788
申请日：2009-07-13
申请人： Antonius Theodorus Wilhelmus Kempen , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra
发明人： Antonius Theodorus Wilhelmus Kempen , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra
CPC分类号： G03F7/2008 , G03F7/70575 , G03F7/70916 , G03F7/70925 , G03F7/70983 , G21K1/00
摘要： A lithographic apparatus includes a source configured to generate a radiation beam comprising desired radiation and undesired radiation using a plasma, an illumination system configured to condition the radiation beam and to receive hydrogen gas during operation of the lithographic apparatus, and a support structure constructed to hold a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus is configured such that the radiation beam on entering the projection system includes at least 50% of the undesired radiation that is generated by the plasma and includes wavelengths of radiation that interact with the hydrogen gas to generate hydrogen radicals.
摘要翻译： 光刻设备包括被配置为产生包含期望辐射和使用等离子体的不期望辐射的辐射束的源，被配置为调节辐射束并在光刻设备操作期间接收氢气的照明系统，以及构造成保持 图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底，并且投影系统被配置为将图案化的辐射束投影到衬底的目标部分上。 光刻设备被配置为使得进入投影系统的辐射束包括由等离子体产生的不期望辐射的至少50％，并且包括与氢气相互作用以产生氢自由基的辐射波长。
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6.发明授权Collector mirror assembly and method for producing extreme ultraviolet radiation 有权收集器镜组件和产生极紫外辐射的方法公开(公告)号：US09013679B2
公开(公告)日：2015-04-21
申请号：US13641069
申请日：2011-03-18
CPC分类号： G02B5/08 , G03F7/20 , G03F7/70033 , G03F7/70175 , G03F7/70808 , G03F7/70841 , G03F7/70908 , G03F7/70916 , G03F7/70933 , G21K5/04
摘要： A collector mirror assembly includes a collector mirror that includes a reflective surface and a hole having an edge. The hole extends through the reflective surface. The assembly also includes a tubular body having an inner surface and an outer surface. The tubular body is constructed and arranged to guide a gas flow in a direction substantially transverse to the reflective surface. The outer surface of the tubular body and the edge of the hole form an opening arranged to guide a further gas flow that diverges with respect the gas flow substantially transverse to the reflective surface.
摘要翻译： 收集器反射镜组件包括收集器反射镜，其包括反射表面和具有边缘的孔。 孔延伸穿过反射表面。 组件还包括具有内表面和外表面的管状体。 管状体被构造和布置成沿着基本横向于反射表面的方向引导气流。 管状体的外表面和孔的边缘形成开口，该开口布置成引导相对于基本上横向于反射表面的气流发散的另外的气流。
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7.发明授权公开(公告)号：US08890099B2
公开(公告)日：2014-11-18
申请号：US14342007
申请日：2012-07-27
CPC分类号： H05G2/006 , B22D43/004 , G03F7/70033 , H05G2/005 , H05G2/008 , Y10S430/146 , Y10T29/49826
摘要： A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.
摘要翻译： 用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融金属燃料液滴流产生EUV的辐射源具有燃料液滴发生器，其布置成提供燃料液滴流和至少一个配置成在 至少一些所述燃料液滴，从而产生辐射。 燃料液滴发生器具有喷嘴，燃料供应管线和储存器，其中泵送装置被布置成以液滴流的形式从燃料供给管路提供来自储存器的熔融金属燃料流。 燃料液滴发生器在燃料供给管线中具有可替换的过滤器组件，布置成在使用中过滤熔融金属燃料，以阻止喷嘴堵塞燃料中的固体颗粒杂质。
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公开(公告)号：US20130077071A1
公开(公告)日：2013-03-28
申请号：US13599494
申请日：2012-08-30
CPC分类号： H05G2/005 , G03F7/70033 , H05G2/006 , H05G2/008 , Y10T29/49815 , Y10T29/49817 , Y10T29/49826 , Y10T29/49865
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a reservoir configured to retain a volume of fuel; a nozzle, in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma; and a contamination filter assembly located in a fuel flow path of the radiation source, upstream of a nozzle outlet, a filter medium of that contamination filter assembly being held in place within the contamination filter assembly by a clamping force provided by one or more objects that at least partially surround the filter medium.
摘要翻译： 根据本发明的第一方面，提供了一种辐射源，包括：储存器，其构造成保持一定体积的燃料; 喷嘴，其与所述储存器流体连接，并且构造成沿着等离子体形成位置的轨迹引导燃料流; 激光器，被配置为在所述等离子体形成位置处的所述流处引导激光辐射，以在使用中产生辐射产生等离子体; 以及污染过滤器组件，其位于辐射源的燃料流动路径中，在喷嘴出口的上游，该污染过滤器组件的过滤介质通过由一个或多个物体提供的夹紧力保持在污染过滤器组件内的适当位置， 至少部分地围绕过滤介质。
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公开(公告)号：US09192039B2
公开(公告)日：2015-11-17
申请号：US14241993
申请日：2012-07-27
申请人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Corne Rentrop , Dennis De Graaf , Frits Gubbels , Gregory Richard Hayes , Hubertus Johannes Van De Wiel
发明人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Corne Rentrop , Dennis De Graaf , Frits Gubbels , Gregory Richard Hayes , Hubertus Johannes Van De Wiel
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/006
摘要： A radiation source having a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location, a laser configured to direct laser radiation at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma. The nozzle has an internal surface that is configured to prevent contamination present in fuel used to form the fuel droplets from being deposited on that internal surface.
摘要翻译： 一种具有喷嘴的辐射源，所述喷嘴被配置为沿着轨迹朝向等离子体形成位置引导燃料液滴流;激光器，被配置成将等离子体形成位置处的燃料液滴处的激光辐射引导，以在使用中产生辐射产生等离子体。 喷嘴具有内表面，其被构造成防止存在于用于形成燃料液滴的燃料中的污染物沉积在该内表面上。
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公开(公告)号：US09119280B2
公开(公告)日：2015-08-25
申请号：US14234982
申请日：2011-12-13
申请人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
发明人： Antonius Theodorus Wilhelmus Kempen , Erik Roelof Loopstra , Christian Wagner , Henricus Gerardus Tegenbosch , Gerardus Hubertus Petrus Maria Swinkels
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location. The catch includes a container configured to contain a fluid; a driver configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.
摘要翻译： 辐射源包括：喷嘴，其构造成沿着等离子体形成位置的轨迹引导燃料液滴流; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块。 捕获器包括构造成容纳流体的容器; 驱动器，配置成驱动流体，使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。
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