专利检索 ap:("Johannes Hubertus Josephina Moors" OR "Norbertus Benedictus Koster" OR "Erik Roelo Loopstra" OR "Martin Frans Pierre Smeets" OR "Antonius Theodorus Wilhelmus Kempen") AND inv:"Martin Frans Pierre Smeets" 第 1 页

1.

发明授权
Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method 有权
标题翻译：包括磁体的光刻设备，用于保护光刻设备中的磁体的方法和器件制造方法

公开(公告)号：US08446560B2

公开(公告)日：2013-05-21

申请号：US12735823

申请日：2009-02-19

申请人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelo Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen

发明人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelo Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen

IPC分类号： G03B27/52 , G03B27/42

CPC分类号： G03F7/70933 , G03F7/70808 , G03F7/70858 , G03F7/70916

摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

2.

发明申请
LITHOGRAPHIC APPARATUS COMPRISING A MAGNET, METHOD FOR THE PROTECTION OF A MAGNET IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：包含磁铁的平面设备，用于保护磁铁的方法和设备制造方法

公开(公告)号：US20110013157A1

公开(公告)日：2011-01-20

申请号：US12735823

申请日：2009-02-19

申请人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen

发明人： Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelof Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen

IPC分类号： G03B27/32 , H01F7/02

CPC分类号： G03F7/70933 , G03F7/70808 , G03F7/70858 , G03F7/70916

摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

3.

发明授权
Clamping device and object loading method 有权
标题翻译：夹紧装置和物体加载方法

公开(公告)号：US09013682B2

公开(公告)日：2015-04-21

申请号：US12451749

申请日：2008-06-20

申请人： Rene Theodorus Petrus Compen , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens , Martin Frans Pierre Smeets

发明人： Rene Theodorus Petrus Compen , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens , Martin Frans Pierre Smeets

IPC分类号： G03F7/20 , H01L21/683 , H01L21/687

CPC分类号： G03F7/70783 , G03F7/707 , H01L21/6838 , H01L21/68742 , H01L21/6875

摘要： The present invention relates to a clamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.

摘要翻译： 夹紧装置技术领域本发明涉及一种构造成将物体（20,120）夹持在支撑件（1,101）上的夹持装置。夹紧装置包括：第一装置，其被配置为使用第一力将物体和支撑件彼此远离;以及第二装置，其被配置为使用第二力将物体和支撑件朝向彼此强制。第一装置和第二装置构造成在完成将物体夹持在支撑件上之前分别同时施加第一力和第二力以将物体成形为期望的形状。

4.

发明授权
Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法

公开(公告)号：US07304715B2

公开(公告)日：2007-12-04

申请号：US10917535

申请日：2004-08-13

申请人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov

发明人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov

IPC分类号： G03B27/52 , G03B27/42

CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.

摘要翻译： 公开了一种光刻设备。该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。

5.

发明授权
Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法

公开(公告)号：US08913228B2

公开(公告)日：2014-12-16

申请号：US11730749

申请日：2007-04-03

申请人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren

发明人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren

IPC分类号： G03B27/58 , G03F7/20 , F16L55/053

CPC分类号： G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783

摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

摘要翻译： 公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。衬底台包括配置成保持调理流体并调节衬底台的调节系统。调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。

6.

发明申请
Lithographic Apparatus and Device Manufacturing Method 审中-公开
标题翻译：光刻设备和器件制造方法

公开(公告)号：US20090086187A1

公开(公告)日：2009-04-02

申请号：US12189546

申请日：2008-08-11

申请人： Rene Theodorus Petrus COMPEN , Martin Frans Pierre Smeets

发明人： Rene Theodorus Petrus COMPEN , Martin Frans Pierre Smeets

IPC分类号： G03B27/60 , G03B27/32

CPC分类号： H01L21/67288 , G03F7/707 , G03F7/70783 , H01L21/6838

摘要： A clamping device can be configured to clamp an object on a support. The clamping device can include a first device configured to exert an attracting force on the object, and a second device configured to exert a rejecting force on the object. The first device and second device can be configured to simultaneously exert an attracting and a rejecting force on the object to shape the object to a desired shape before clamping of the object on the support. A method is provided for loading an object on a support, comprising the steps of shaping the object in a desired shape spaced from the support. The shaping can include subjecting the object simultaneously to an attracting force pulling the object toward the support and a rejecting force pushing the object away from the support, and clamping the object on the support.

摘要翻译： 夹持装置可以被配置为将物体夹持在支撑件上。夹持装置可以包括构造成在物体上施加吸引力的第一装置，以及被配置为在物体上施加排斥力的第二装置。第一装置和第二装置可以被配置为在将物体夹持在支撑件上之前同时对物体施加吸引力和拒绝力，以将物体成形为期望的形状。提供了一种用于将物体加载在支撑件上的方法，包括以与所述支撑件间隔开的期望形状对所述物体成形的步骤。成形可以包括同时对待物体将吸引力拉向支撑件，并且将物体推离支撑件，并将物体夹持在支撑件上。