Invention Grant
- Patent Title: Film grain simulation method
- Patent Title (中): 电影纹理模拟方法
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Application No.: US12589217Application Date: 2009-10-20
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Publication No.: US08447127B2Publication Date: 2013-05-21
- Inventor: Cristina Gomila , Joan Llach , Jeffrey Allen Cooper
- Applicant: Cristina Gomila , Joan Llach , Jeffrey Allen Cooper
- Applicant Address: FR Boulogne-Billancourt
- Assignee: Thomson Licensing
- Current Assignee: Thomson Licensing
- Current Assignee Address: FR Boulogne-Billancourt
- Agent Robert D. Shedd; Robert B. Levy
- Main IPC: G06K9/46
- IPC: G06K9/46 ; G06K9/66 ; G06K9/62 ; G06K9/40 ; H04N7/01 ; H04N11/20 ; H04N1/32 ; H04N1/41 ; H04N7/12 ; H04N11/02 ; H04N11/04 ; H04B1/66 ; G06K9/36

Abstract:
Briefly, in accordance with a preferred embodiment of the present principles, simulation of a block of film grain for addition to a block of an image occurs by first establishing at least one image parameter in accordance with at least one attribute of the block. Thereafter, a block of film grain is established in accordance with the image parameter. Deblocking filtering can be applied to the film grain block.
Public/Granted literature
- US20100080455A1 Film grain simulation method Public/Granted day:2010-04-01
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