Invention Grant
- Patent Title: Robust FBEOL and UBM structure of C4 interconnects
- Patent Title (中): C4互连的鲁棒FBEOL和UBM结构
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Application No.: US13478076Application Date: 2012-05-22
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Publication No.: US08450849B2Publication Date: 2013-05-28
- Inventor: Minhua Lu , Eric D. Pefecto , David L. Questad , Sudipta K. Ray
- Applicant: Minhua Lu , Eric D. Pefecto , David L. Questad , Sudipta K. Ray
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Robert J. Eichelburg
- Main IPC: H01L23/12
- IPC: H01L23/12 ; H01L21/44

Abstract:
An electrical conductor is connected to a first microcircuit element having a first connector site axis and a second microcircuit having a second connector site axis. The first microcircuit and the second microcircuit are separated by and operatively associated with a first electrical insulator layer. The conductor and the first microcircuit element are separated by and operatively associated with a second electrical insulator layer. At least one of the first electrical insulator layer and the second electrical insulator layer comprise a polymeric material. The microcircuit includes a UBM and solder connection to a FBEOL via opening. Sufficiently separating the first connector site axis and the second connector site axis so they are not concentric, decouples the UBM and solder connection to the FBEOL via opening. This eliminates or minimizes electromigration and the white bump problems. A process comprises manufacturing the microcircuit.
Public/Granted literature
- US20120286433A1 Robust FEBOL and UBM Structure of C4 Interconnects Public/Granted day:2012-11-15
Information query
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