发明授权
US08481344B2 Methods of evaporating metal onto a semiconductor wafer in a test wafer holder 有权
在测试晶片保持器中将金属蒸发到半导体晶片上的方法

Methods of evaporating metal onto a semiconductor wafer in a test wafer holder
摘要:
Apparatus and methods for evaporating metal onto semiconductor wafers are disclosed. One such apparatus can include an evaporation chamber that includes a wafer holder, such as a dome, and a test wafer holder that is separate and spaced apart from the wafer holder. In certain implementations, the test wafer can be coupled to a cross beam supporting at least one shaper. A metal can be evaporated onto production wafers positioned in the wafer holder while metal is evaporated on a test wafer positioned in a test wafer holder. In some instances, the production wafers can be GaAs wafers. The test wafer can be used to make a quality assessment about the production wafers.
信息查询
0/0