Invention Grant
- Patent Title: Multi charged particle beam writing apparatus and multi charged particle beam writing method
- Patent Title (中): 多带电粒子束写入装置和多带电粒子束写入方法
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Application No.: US13633468Application Date: 2012-10-02
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Publication No.: US08492732B2Publication Date: 2013-07-23
- Inventor: Munehiro Ogasawara
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-219909 20111004
- Main IPC: H01J3/07
- IPC: H01J3/07 ; H01J37/141 ; G21K5/04

Abstract:
A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.
Public/Granted literature
- US20130082187A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2013-04-04
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