Invention Grant
US08492732B2 Multi charged particle beam writing apparatus and multi charged particle beam writing method 有权
多带电粒子束写入装置和多带电粒子束写入方法

Multi charged particle beam writing apparatus and multi charged particle beam writing method
Abstract:
A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.
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