发明授权
- 专利标题： Alkali developable photosensitive resin composition and dry film manufactured by the same
- 专利标题（中）： 碱显影性感光性树脂组合物及其制造的干膜
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申请号： US12451505申请日： 2008-08-20
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公开(公告)号： US08551687B2公开(公告)日： 2013-10-08
- 发明人: Kwang-Joo Lee , Heon-Sik Song , You-Jin Kyung , Joo-Eun Ko , Jung-Il Yoon , Jung-Jin Shim
- 申请人： Kwang-Joo Lee , Heon-Sik Song , You-Jin Kyung , Joo-Eun Ko , Jung-Il Yoon , Jung-Jin Shim
- 申请人地址： KR Seoul
- 专利权人： LG Chem, Ltd.
- 当前专利权人： LG Chem, Ltd.
- 当前专利权人地址： KR Seoul
- 代理机构： McKenna, Long & Aldridge, LLP
- 优先权： KR10-2007-0083555 20070820
- 国际申请： PCT/KR2008/004850 WO 20080820
- 国际公布： WO2009/025498 WO 20090226
- 主分类号： G03F7/027
- IPC分类号： G03F7/027 ; G03F7/004 ; G03F7/037 ; G03F7/028 ; G03F7/031 ; G03C1/04 ; C08F2/52 ; C08J3/28
摘要：
The present invention relates to a polyimide photosensitive resin composition that is capable of being developed by an alkali aqueous solution, and a dry film that is produced by the same, and more particularly to a photosensitive resin composition which comprises a) a polyamic acid, b) two or more (meth)acrylate—based compounds that include one or more double bonds between carbons, c) a photopolymerization initiator, d) a phosphorus—based flame retardant, and e) an organic solvent, and a dry film that is produced by the same.
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