发明授权
US08578313B2 Pattern-clip-based hotspot database system for layout verification
有权
基于模式片段的热点数据库系统进行布局验证
- 专利标题: Pattern-clip-based hotspot database system for layout verification
- 专利标题(中): 基于模式片段的热点数据库系统进行布局验证
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申请号: US12109118申请日: 2008-04-24
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公开(公告)号: US08578313B2公开(公告)日: 2013-11-05
- 发明人: Zongwu Tang , Daniel Zhang , Alex Miloslavsky , Subarnarekha Sinha , Jingyu Xu , Kent Y. Kwang , Kevin A. Beaudette
- 申请人: Zongwu Tang , Daniel Zhang , Alex Miloslavsky , Subarnarekha Sinha , Jingyu Xu , Kent Y. Kwang , Kevin A. Beaudette
- 申请人地址: US CA Mountain View
- 专利权人: Synopsys, Inc.
- 当前专利权人: Synopsys, Inc.
- 当前专利权人地址: US CA Mountain View
- 代理机构: Park, Vaughan, Fleming & Dowler LLP
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.
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